High-Power Femtosecond Lasers

Transcription

1 High-Power Femtosecond Lasers FEATURES 190 fs ps tunable pulse duration Up to 2 mj pulse energy Up to 20 W average power Single pulse 1 MHz tunable repetition rate Includes pulse picker for pulse-on-demand operation Rugged, industrial grade mechanical design Automated harmonic generators (2H, H, 4H, H) PHAROS is a single-unit integrated femtosecond laser system combining millijoule pulse energies and high average power. PHAROS features a mechanical and optical design optimized for industrial applications such as precise material processing. Market-leading compact size, integrated thermal stabilization system and sealed design allows PHAROS integration into machining workstations. The use of solid state laser diodes for pumping of Yb medium significantly reduces maintenance cost and provides long laser lifetime. Most of the PHAROS output parameters can be easily set via PC tuning the laser for a particular application in seconds. Tunability of laser output parameters allows PHAROS system to cover applications normally requiring different classes of lasers. Tunable parameters include: pulse duration (190 fs ps), repetition rate (single pulse to 1 MHz), pulse energy (up to 2 mj) and average power (up to 20 W). Its deliverable power is abundant for most of material processing applications at high machining speeds. The built-in pulse picker allows convenient control of the laser output in pulse-on-demand mode. It comes along with an extensive external control interface dedicated for easy laser integration into larger setups and machining workstations. PHAROS compact and robust optomechanical design includes easy to replace modules with temperature stabilized and sealed housings ensuring stable laser operation across varying environments. PHAROS is equipped with an extensive software package, which ensures smooth hands-free operation as well as allows fast and easy integration into various processing devices. PHAROS is built upon the conventional chirped pulse amplification technique, employing the seed oscillator, regenerative amplifier and pulse stretcher/compressor modules. Ambient temperature, C 40 Ambient temperature 6.0 Output power, RMS=0.12% Beam direction, µrad Temperature Horizontal Vertical Temperature, C PHAROS output power with power lock on under unstable environment

2 pecifications Model Pharos-4W Pharos-6W Pharos-W Pharos-1W Pharos-20W Pharos SP Pharos SP 1. Pharos 2mJ Max. average power 4 W 6 W W 1 W 20 W 6 W 6 W Pulse duration (assuming Gaussian pulse shape) < 290 fs < 190 fs < 00 fs Pulse duration range 290 fs ps 190 fs ps 00 fs ps Max. pulse energy > 0.2 mj > 0.2 mj / > 0.4 mj > 1.0 mj > 1. mj > 2 mj Beam quality TEM₀₀; M² < 1.2 TEM₀₀; M² < 1. Base repetition rate 1 khz 200 khz (extendable to 1 MHz) ¹) Pulse selection Centre wavelength Single-Shot, Pulse-on-Demand, any base repetition rate division 2 nm ± nm Output pulse-to-pulse stability < 0. % rms over 24 hours ²) Power stability < 0. % over 0 h Pre-pulse contrast < 1 : 00 Post-pulse contrast < 1 : 200 Polarization Beam pointing stability Linear, horizontal < 20 µrad/ C Oscillator output Optional, please see specifications of FLINT oscillators on page 14 1) Some particular repetition rates are software denied due to system design. 2) Under stable environmental conditions. SH ACF a.u Gaussian fit 22 fs Relative spectral intensity, a.u Spectral FWHM =.2 nm Delay, fs Pulse duration of Pharos Wavelength, nm Spectrum of Pharos Typical Pharos far field beam profile at 200 khz 00 Pulse energy, µj 00 0 Pharos 2 mj Pharos-SP 1. mj Pharos-SP 1 mj Pharos-20W 400 µj Pharos-W 200 µj Pharos-4W 200 µj Waist diameter, µm Repetition rate, khz Pulse energy vs PRR Z location, mm Typical Pharos M² measurement data Typical Pharos near field beam profile at 200 khz RMS < 0.0% Pharos long term stability graph

3 Pump current, A Pump current, A (4) (74) (272) Output power of industrial PHAROS lasers operating 24/7 and current of pump diodes during the years 670 output without H Auto 2H Auto H, 4H 1 nm 4, 27 nm output with Auto H 60 PHAROS laser drawing Physical dimensions (mm) Laser head Power supply rack for PHAROS-4W Power supply rack for other PHAROS models 670 L x 60 W x 212 H 640 L x 20 W x 0 H 640 L x 20 W x 660 H Utility requirements Electric Room temperature Relative humidity 1 VAC, 0-60 Hz, 20 A or 220 VAC, 0-60 Hz, A 1-0 C (air conditioning recommended) 20-0 % (non condensing)

4 Automated Harmonic Generators PHAROS laser can be equipped with optional automated harmonics modules. Selection of fundamental (), second (1 nm), third (4 nm), fourth (27 nm) or fifth (206 nm) harmonic output is available by software control. Harmonic generators are designed to be used in industrial applications where a single output wavelength is desired. Modules are mounted directly on the output of the laser and integrated into the system. The principle of OEM harmonic generators operation is based on collinear generation of higher laser radiation harmonics in angle-phase-matched nonlinear crystals. The optical layout of OEM harmonic generator also includes beam reduction and collimation optics that ensures highest harmonics conversion efficiencies. All the accessible harmonics exiting OEM harmonic generators are separated from the pump radiation by dichroic mirrors. SPECIFICATIONS Model 2H 2H-H 2H-4H 4H-H Output wavelength (automated selection) 1 nm 1 nm 4 nm 1 nm 27 nm 27 nm 206 nm Input pulse energy μj 0 00 μj μj μj Pump pulse duration fs Conversion efficiency Beam quality (M 2 ) <200 μj pump Beam quality (M 2 ) >200 μj pump * Max 1 W output. >0 % (2H) <1.4 (2H) <1.7 (2H), <1. typical >0 % (2H) >2 % (H) <1.4 (2H) <1.7 (H) <1.7 (2H), <1. typical <2 (H), <1.7 typical > % (2H) > % (4H) * <1.4 (2H) n/a (4H) <1.7 (2H), <1. typical n/a (4H) > % (4H) * > % (H) n/a n/a PHAROS-SP 2H optimized for 00 µj pump H optimized for 00 µj pump 2H optimized for 200 µj pump H optimized for 200 µj pump 2H optimized for 0 µj pump H optimized for 0 µj pump RMS = 0.27% Pulse energy, µj H output stability 1.4 RMS = 0.2% Repetition rate, khz Harmonics energy vs pulse repetition rate H output stability

5 asers Industrial grade Optical Parametric Amplifier new FEATURES Based on experience with ORPHEUS line of OPA products Manually tunable wavelength Industrial grade design provides excellent long-term stability Very small footprint Bandwidth limited or short-pulse configurations available CEP option I-OPA is an optical parametric amplifier of white-light continuum pumped by the PHAROS laser. This OPA is focused on generating long-term stable output with reliable and handsoff operation. Manually tunable output wavelength extends the application possibilities of a single laser source, instead of requiring multiple lasers based on different technologies. In comparison to standard ORPHEUS line of devices, the I-OPA lacks only computer controlled wavelength selection. On the other hand, in-laser mounted design provides mechanical stability and eliminates the effects of air-turbulence, ensuring stable long-term performance and minimizing energy fluctuations. Output power, mw I-OPA-ONE signal I-OPA-ONE idler I-OPA signal I-OPA idler Wavelength, nm I-OPA module energy conversion curves. Pump: PHAROS-W, 0 µj, 0 khz Pulse energy, µj PHAROS i-opa model comparison table Model I-OPA I-OPA-F I-OPA-ONE I-OPA-CEP Based on OPA ORPHEUS ORPHEUS-F ORPHEUS-ONE Pump pulse energy 00 µj 400 µj µj µj Pulse repetition rate Up to 1 MHz Up to 0 khz Tuning range, signal nm nm Tuning range, idler nm nm nm nm Conversion efficiency signal+idler combined >12 % >12 % >1 % > % Pulse energy stability < 2% STD over 1 min nm nm 60 0 nm nm nm nm Pulse bandwidth 0 10 cm cm cm -1 ~10 cm -1 Pulse duration fs 0 fs 0 fs fs < 200 fs Applications Micro-machining Microscopy Spectroscopy 1) Better stability can be specified for a specific wavelength (e.g. < 1% STD at 00 nm). 2) Output pulse duration depends on wavelength and pump laser pulse duration. ) I-OPA-F outputs broad bandwidth pulses which are compressed externally. Nonlinear microscopy Ultrafast spectroscopy Micro-machining Mid-IR generation OPCPA front-end

6 Comparison with other femtosecond and picosecond LASERS Lasers Laser technology Our solution HG or HIRO I-OPA-F I-OPA-ONE Pulse energy at 0 khz, using PHAROS-W laser Excimer laser (19 nm, 21 nm) H of PHAROS (20 nm) µj TH of Ti:Sa (266 nm) 4H of PHAROS (27 nm) µj TH of Nd:YAG ( nm) H of PHAROS (4 nm) 2 µj SH of Nd:YAG (2 nm) 2H of PHAROS (1 nm) 0 µj µj Ti:Sapphire (00 nm) OPA output (70 0 nm) µj Nd:YAG (64 nm) PHAROS output () 0 µj Cr:Forsterite (1240 nm) OPA output ( nm) µj Erbium (160 nm) OPA output ( nm) µj 1 µj Thulium / Holmium ( µm) OPA output ( nm) 2 µj µj Other sources ( µm) OPA output 1 µj Note that the pulse energy scales linearly in a broad range of pump parameters. For example, a PHAROS-20W laser at 0 khz (400 µj energy) will increase the output power twice, and the pulse energy 4 times compared to the reference table above. The pulse duration at the output is <00 fs in all cases. The OPA output is not limited to these particular ranges of operation, it is continuously tunable as shown in energy conversion curves. (9) Idler Signal Residual OPA pump (1 nm or ) Optional Uncompressed Fundamental (for SHBC) Fundamental () Pharos with I-OPA output ports PHAROS with I-OPA-F and compressors for signal and ilder 埼玉県さいたま市南区南浦和 TEL: FAX: voc@phototechnica.co.jp