ENVISION A NEW WAY OF COMBINED COMPETENCIES

Transcription

1 Carl Zeiss SMT Nano Technology Systems Division ENVISION A NEW WAY OF COMBINED COMPETENCIES ZEISS NVision 40 The new 3D CrossBeam Workstation that combines FIB and GEMINI SEM columns to a unique system enabling a variety of outstanding nanotech capabilities Enabling the Nano-Age World

2 NVision 40 The ultimate CrossBeam workstation for nanoscale level materials and physical failure analysis in industrial production as well as state-of-the art research in nanotechnology, materials and life sciences. 2

3 NVision 40 First-Class Efficiency and Convenience Envision the Value of Precision NVision maximum efficiency and most convenient workflow providing unique transparency, unparalleled control, and most precise structuring while viewing. NVision the fastest and most precise nanostructuring system thanks to best-in-class ion beam current density and resolution of the SIINT zeta FIB column. NVision excellent simultaneous in-lens low voltage SE and BSE/EsB imaging even at short WD and with tilted stage for combined topographic and materials contrast. 200 nm NVision nanoscale controlled cross-sectioning and site specific automated TEM sample preparation through high resolution imaging while milling. 1 µm NVision proven SIINT GIS technology providing support for a wide range of versatile gas processes future upgrade path assured by gas mixing technology and unlimited precursor options. 200 nm 3

4 NVision 40 The New and Powerful Combination of FIB and GEMINI Column 200 nm Concept The NVision 40 CrossBeam workstation units the imaging and analytical capabilities of the high resolution field emission GEMINI SEM with the high performance SIINT zeta FIB column. Together with the new SIINT GIS supporting liquid, solid state and gaseous precursors as well as gas mixing technology and carbon free SiO 2 deposition the NVision 40 represents a powerful tool for 3D nanoscale high resolution imaging, structuring and analytics. The NVision 40 features a dome type chamber design and a pendulumn vibration insulation system for enhanced stability. Numerous access ports for various detectors (EDS, EBSD, STEM, 4QBSO) as well as sample manipulation and probing systems ensure full support for all your analytical and micromanipulation needs. These versatile features and flexible upgrade possibilities make the NVision 40 a highly valuable platform for your today's and future nanotechnology needs. Imaging The GEMINI electron optics offers high resolution with excellent contrasts even at low voltages (2,5 1 kv). The Multi-mode STEM detector allows simultaneous bright-field and dark-field imaging as well as oriented dark-field imaging (ODF). By using FESEM and FIB simultaneously the ion milling process can be controlled by live high resolution imaging at nanoscale level. This means highest productivity thanks to 100% control for end point detection. The in-lens SE and EsB detectors allow simultaneous SE and BSE imaging for comprehensive sample characterisation in one shot especially at ultra low voltages for high surface sensitivity, short WDs, and with tilted stage. Structuring The zeta FIB column with its accelerating objective lens technology offers a resolution of 4 nm with up to 20% increased current densities with respect to conventional ion optics. This combined with the unique low voltage FIB performance significantly impacts time to the sample and the sample quality. 200 nm Software The proven SmartSEM TM software platform ensures maximized convenience. The software features fully unattended multi-site preparation of samples including a wizard for intuitively creating automated sample preparation recipes. The recipe manager guarantees efficient organization and management of these automated preparation routines. Real time movies captured during machining can be processed by the SmartSEM TM software to generate volumetric reconstruction and animated 3D models of the samples. The integrated macro language gives full access to all instrument functions for efficiently automating user specific applications, functions and customizing of lookand-feel. 1 µm 4

5 zeta FIB column GEMINI column Multi channel GIS 2 x IR-CCD camera Additional ports for EDS, EBSD, probing, sample manipulation systems STEM, 4QBSD, Everhart-Thornley SE detector, In-lens SE/EsB detectors 5

6 Applications Efficient solutions answering all your nanoanalytics, imaging and structuring needs 2 µm 100 nm Dual damascene 65 nm copper TEM sample fabricated completely automated. Oriented darfield STEM imaging of tungsten vias. 2 µm 1 µm Sample manipulation and probing by in situ micromanipulation systems. Pattern generated by e-beam lithography. d = 1.2 µm 6 3D EBSD sequence of a Ni 3 Al cross section. (Images curtesy of S. Zaefferer, MPI für Eisenforschung Düsseldorf) Cross section of an immuno labled chromosome. The position of the markers can be well localized in the in-lens backscattered (EsB) image at only 2 kv beam energy. (Sample courtesy of Prof. Wanner, MPI München )

7 Technical Data Essential Specifications NVision 40 SEM FIB Resolution Gemini Column 20kV 1kV SIINT 100 mm zeta FIB column 30kV Magnification 30x - 900kx 475x - 500kx Probe Current 4pA - 20nA < 0.1pA - 45nA Acceleration Voltage low voltage option kV 5-30kV 1-5kV (option) Emitter Thermal field emission type Gas liquid metal ion source Gas Injection System Four channel single injector GIS system for - up to two different solid state precursors and - up to four different gaseous or liquid precursors on individually mass flow controlled gas lines. Wide range of precursor options including W, Pt, C, and silicon oxide insulator deposition as well as precursors for enhanced or selective materials etching. Stage 6-axis super eucentric, all motorized stage. Motion range X, Y = 100mm Z = 43mm Z = 10mm Tilt = -10 to 60 Rotation = 360 continuous Detectors In-column: In-lens: Chamber: EsB detector with filtering grid for BSE detection, filtering grid voltage 0 to V. High efficiency annular type SE detector Everhart Thornley type SE detector 2 chamber IR-CCD cameras 4Q BSE detector (optional) GEMINI multimode BF/DF STEM detector (optional) Chamber Size: Load lock: 330 mm (D) x 266 mm (H) 100 mm manual general purpose load lock with two specimen exchange positions. 7 additionally available ports for various options including STEM, 4QBSD, EBSD, EDX detectors, and sample manipulation systems. Image Acquisition and Image Display Resolution: Processing: from 512x384 to 3072x2304 pixel pixel averaging, frame/line averaging and integration System Control Integrated SmartSEM TM user interface based on WindowsXP operating system, controlled by mouse, keyboard, joystick and control panel. Space requirement Recommended footprint: 2.30 m x 2.70 m Recommended working area: 2.70 m x 3.80 m 7

8 Carl Zeiss SMT Nano Technology Systems Division Carl Zeiss NTS & SIINT worldwide Carl Zeiss SMT/NTS Distributors SIINT Carl Zeiss NTS GmbH A Carl Zeiss SMT AG Company Carl-Zeiss-Str Oberkochen Germany Tel / Fax / Global Solution Provider The Nano Technology Systems Division of Carl Zeiss SMT provides its customers with total solutions featuring the latest leading-edge EM technology. The company s extensive know-how, meticulously acquired over 60 years in the field of E-beam technology, has brought many pioneering innovations to the market. Our global applications and service network guarantees fast, reliable and high quality support sharply focused on customer requirements. Combined with dedicated upgrade strategies, this will protect your investment for its entire lifetime. The core technology embedded in our innovative products enables us to provide solutions which add value to our customers business. Enabling the Nano-Age World SII NanoTechnology Inc. RBM Tsukiji Building Shintomi , Chuo-Ku, Tokyo Japan Telephone: +81 (0) Facsimile: +81 (0) info-nts@smt.zeiss.com Carl Zeiss SMT Ltd. 511 Coldhams Lane Cambridge CB1 3JS UK Tel / Fax / info-uk@smt.zeiss.com Carl Zeiss SMT Inc. One Zeiss Drive, Thornwood New York USA Tel / Fax / info-usa@smt.zeiss.com Carl Zeiss SMT S.a.s. Zone d Activité des Peupliers 27, rue des Peupliers - Bâtiment A Nanterre France Tel Fax info-fr@smt.zeiss.com Plus a worldwide network of authorised distributors Due to a policy of continuous development, we reserve the right to change specifications without notice. Errors excepted. Ver by Carl Zeiss SMT, Oberkochen