ZEMAX. Software for optical design. Illumination and CAD Import. Non-Sequential. Physical Optics

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1 ZEMAX Software for optical design Lens Design Illumination and CAD Import Non-Sequential Physical Optics Fiber Systems Scattering and Stray Light ZEMAX Development Corporation 4901 Morena Blvd., Suite 207 San Diego, California USA Tel: (858) Fax: (858)

2 AN OVERVIEW OF ZEMAX The ZEMAX Optical Design Program is a comprehensive software tool for optical design. ZEMAX integrates all the features required to conceptualize, design, optimize, analyze, tolerance, and document virtually any optical system. All of these powerful features are integrated into an intuitive user interface. ZEMAX offers power, speed, flexibility, ease of use, and value in one comprehensive program. Three different ZEMAX editions Three different editions of ZEMAX are available: SE, XE, and EE. Some features described are only available in the XE or EE editions of ZEMAX. For a summary see the table on the back page. Not all features available in ZEMAX are mentioned in this brochure. If you have a special requirement or need a feature not listed, please call for more information. ZEMAX can model both sequential and non-sequential imaging and non-imaging systems, as described below. Sequential ray tracing Most imaging systems are well described by a sequential list of surfaces; each of which defines the boundary between one media and the next. Rays are traced from the object surface to each surface in a specific sequential order. Optical systems such as camera lenses, telescopes, and microscopes are well described by this model. Sequential ray tracing offers many advantages for these systems, such as ray tracing speed, generality of surface shapes and properties, and straightforward optimization and tolerancing. Optical surfaces in ZEMAX may be reflective, refractive, or diffractive. In addition, surface properties such as variable transmission due to thin film coatings may be modeled in detail. The bulk media between surfaces may be homogeneous, such as common glass or air. Media may also be of an arbitrary gradient index form; where the index is any complex function of position, wavelength, temperature, or other properties. Birefringent materials, where the index is a function of polarization state and ray angle are also supported. Many surface and media types are predefined and ready to use in ZEMAX. All properties of surfaces, including shape, refraction, reflection, index, gradient index, thermal, polarization, transmission, and diffraction are user definable. Non-sequential ray tracing Many important optical systems cannot be well described by the sequential ray trace model, such as complex prisms, light pipes, illumination systems, faceted reflectors, non-imaging systems, or objects of arbitrary shape. Also, scattering and stray light cannot usually be modeled with sequential analysis. These systems require a non-sequential ray trace, where the ray may strike any object in any order. Non-sequential ray tracing allows more detailed analysis of light propagation, including light that is scattered or partially reflected. ZEMAX splits rays striking any surface into multiple scattered or reflected rays, then propagates all the resulting rays. When performing non-sequential ray tracing, ZEMAX uses 3D solid models of optical components, and can trace rays through any solid shape. Scattering, diffraction, gradient index, polarization, and thin films are all supported. ZEMAX performs non-sequential analysis using photometric or radiometric units. Sequential and non-sequential systems ZEMAX supports sequential and non-sequential ray tracing in the same system, if desired. Sequential surfaces may be mixed with non-sequential objects of arbitrary shape, orientation, or position. The ability to handle both types of optical systems within a simple, consistent interface makes ZEMAX the ideal tool for virtually any optical design problem.

3 SOURCES ZEMAX supports different types of sources for sequential and non-sequential analysis. Sequential sources For sequential ray tracing, sources are defined as either field points or extended bitmaps on the object surface. Conventional point sources are available, and field points may be defined using angles, object heights, real image heights, or paraxial image heights. Point sources may be defined with different weights, and vignetting for each source may be specified independently. This allows adjustments in the relative illumination and/or F/# as a function of field position. ZEMAX also supports astigmatic and elliptical diode-type sequential sources. Sources may radiate into any solid angle up to 360 degrees. Extended sources are also available. These sources are user defined using an ASCII format similar to a bitmap image, or in the standard Windows BMP or JPG format. The number of pixels is user defined, and the intensity can vary at each pixel. It is possible to create sources which vary in intensity as a function of wavelength and position. Non-sequential sources Non-sequential sources may be far more complex than sequential sources. Non-sequential sources are generally three-dimensional, and are defined to have an output flux in either Watts or Lumens. A user defined number of rays is generated by each source to control the source sampling. Separate controls are available for the number of rays shown on layouts and analysis windows. The following non-sequential sources are supported: Point uniform, cosine, or Gaussian Elliptical surface or volume Rectangular surface or volume Cylindrical surface or volume Laser diode, or arrays of laser diodes Filament User defined (arbitrary using either table or function) Radiant Imaging s Radiant Source TM Multiple sources may be used at once. Source may also be coherent, with a user-defined coherence length, or incoherent. All sources may be polychromatic or monochromatic. GLASS, LENS, AND TEST PLATE CATALOGS Optical glass catalogs from Schott, Hoya, Ohara, Corning, Sumita, and other vendors are provided. Additional catalogs are supplied which include infrared materials, plastics, and natural materials such as silica. Birefringent material data is also included. The catalogs include dispersion, thermal, stain/acid, cost factor, and other data. All data may be viewed and modified if required, and new data may be added easily. Stock lens catalogs from vendors such as: Coherent, Corning, CVI, Edmund Industrial Optics, Esco, Geltech, JML, LightPath Technologies, Linos Photonics, Melles Griot, Newport, NSG America, Optics for Research, OptoSigma, Philips, Quantum, Rolyn, Ross Optical, and Thorlabs are included. ZEMAX supports automatic test plate fitting. This feature automatically adjusts radii to fit the tooling of a particular vendor. Test plate lists are provided for many lens fabricators. New glass and test plate catalogs may be created by the user, or new data may be added to the existing catalogs. As many catalogs as desired may be created and maintained.

4 SEQUENTIAL SURFACES ZEMAX supports sequential ray tracing through surfaces bounding refractive, reflective, diffractive, or gradient media. Here is a summary of the available surfaces: Type Description Standard Includes planes, spheres, and conics Even aspheric Polynomial asphere with even powers Odd aspheric Polynomial with even and odd powers Paraxial lens A perfect thin lens Paraxial cylinder A perfect thin cylinder lens Toroidal Cylindrical aspheres and toroids Toroidal grating A toroid with a grating superimposed Toroidal hologram A toroid with a hologram superimposed Tilted For modeling planes and wedges Cubic spline A spline of arbitrary shape Irregular For modeling fabrication errors Hologram Two point optically fabricated hologram Diffraction grating Straight line grating, standard substrate Coordinate break Tilts and decenters of element groups Polynomial Nonsymmetric polynomial asphere Fresnel Fresnel zone aspheric ABCD Paraxial ABCD for black box optics Alternate Alternate surface intersection surface Conjugate Two point perfect image surface Gradient index Axial, radial, transverse, user defined Zernike Sag defined by Zernike polynomials Zernike phase Phase defined by Zernike polynomials Extended polynomial Extended term polynomial asphere Binary optic 1 Phase profile XY polynomial Binary optic 2 Phase profile radial polynomial Extended asphere Extended power rotational asphere Extended spline Arbitrary points define sag Extended Fresnel Aspheric Fresnel on curved base Elliptical grating Elliptical grating geometry Superconic A unique aspheric expansion Atmospheric Atmospheric refraction model Biconic Anamorphic conic asphere Grid phase/sag Phase or sag defined by tabular points Zone plate Fresnel Zone Plate surface model Jones matrix For polarizing components Birefringent Uniaxial crystal, extraordinary/ordinary NURBS NURBS based radial or toroidal surface User defined Refractive, reflective, diffractive, GRIN User defined surfaces For those cases where a specialized surface is required, ZEMAX supports a user defined surface. The user defined surface is compiled code in a Windows DLL. For customers that do not have the desire or ability to program specialized surface types, ZEMAX Development Corporation offers this service at a reasonable cost. The vast majority of optics applications do not require custom surface types. The following user defined surfaces, as well as many others, are included with ZEMAX as both examples and as ready to use compiled surfaces: Anamorphic Asphere An unusual XY aspheric surface Lens Array An array of conic aspheric lenses Cylinder Array An array of aspheric cylinder lenses Grating Cylinder Cylindrical surface with grating lines Filter Surface Arbitrary transmission mask example GRIN Cylinder Gradient fiber perpendicular to beam Offset Surface Surface with variable thickness by color

5 SEQUENTIAL ANALYSIS ZEMAX supports a wide variety of analysis tools with extensive options which can be set to customize the method of calculation or presentation. A partial list of features follows. Layouts 2D cross section 3D perspective and wireframe Solid or shaded model Surface, singlet, and doublet element drawings ISO format drawings Fans Ray aberration Optical path difference Pupil aberration Spot Diagrams Standard field-by-field Through focus Full field, Matrix Extended source bitmaps and images Diffraction MTF, PSF Analysis Modulation transfer function (MTF) Sine or square wave MTF Through focus MTF Surface MTF and field MTF maps Point spread function (PSF) Geometric, Huygens, or FFT based MTF/PSF Wavefront maps Encircled Energy Diffraction radial Geometric radial, x, y Extended sources Line/Edge response Miscellaneous Diffraction extended source images Footprint analysis Grid distortion Relative illumination, Vignetting Longitudinal aberration, Lateral color Field curvature and distortion RMS vs. field, focus, or wavelength Interferograms Y-Ybar diagram Chromatic focal shift Dispersion plot, glass map diagrams Glass internal transmittance vs. wavelength Numerical Computations Single and multimode fiber coupling efficiency First order system data Surface power, volume, edge thickness data Ray trace data, real and paraxial Gaussian beam parameters Seidel and Zernike aberrations Wavefront, transverse, longitudinal aberrations YNI contributions Sag tables, maximum aspheric deviation Polarization Ray Tracing Polarization state evolution Polarization ellipse pupil map System transmission Coating reflection, transmission, and absorption Polarization aberrations System transmission fans

6 NON-SEQUENTIAL COMPONENTS Non-sequential ray tracing refers to the ability to compute which object in a list of objects a ray strikes. Applications for non-sequential ray tracing include illumination systems, stray light control, ghost analysis in imaging systems, and general design of non-imaging optical systems. Non-sequential: objects vs. surfaces Traditionally, lens design programs that used surfaces for sequential ray tracing would implement non-sequential ray tracing using the same surface model; the rays would simply intersect surfaces out of sequence. However, real objects cannot be described by the surface paradigm. Accurate tracing of real objects requires the use of 3D solid models. When performing non-sequential ray tracing, ZEMAX uses solid models of optical components, and is not limited to tracing rays through surfaces. Also unlike traditional lens design programs, ZEMAX can split rays at interfaces into multiple rays, and trace the reflected, refracted, scattered, and diffracted rays simultaneously, with correct accounting for energy, polarization, BSDF scattering distributions, thin films, and multiple order diffraction. A non-sequential system model in ZEMAX consists of one or more sources, objects, and detectors. Sources Many sources are included with ZEMAX, and others may be user defined; see the third page of this brochure for details on non-sequential sources. Objects Each object in ZEMAX is a solid or a surface. Objects may be placed anywhere in global coordinates. Object positions and rotations may be linked; this makes it easy to define compound objects and then move the entire assembly as a unit. ZEMAX object types include these and many others: Lenses Standard, aspheres, toroids, MEMS Diffractives Binary, grating, holographic Solid shapes Cylinders, ellipses, rectangles, CPC Faceted objects Completely arbitrary solids or surfaces Fresnel lenses True Fresnel lenses with grooves Imported objects IGES, STEP, SAT, or STL formats All objects may be reflective, refractive, or absorbing. There are no limits to the number of objects. Objects may be imported from CAD programs in IGES, STEP, SAT, or STL format or may be defined using a simple ASCII polygon object format used by ZEMAX. ZEMAX supports many more objects than what is listed here, and arbitrary objects may be easily defined. Objects may be placed inside one another or be placed together to form a compound solid. Detectors Any faceted object may be a detector. There are also dedicated detector objects which display coherent or incoherent irradiance (power per area), or intensity (power per solid angle) as detected anywhere in the optical system. ZEMAX uses either radiometric units (watts) or photometric units (lumens, lux, phot, footcandle, others) for both sources and detectors. Ray database Ray data from any ray trace may be stored in a file. This ray data may be subsequently used in displaying the optical system, or for computing the data in any detector, without the need to trace all the rays again. The ray database also allows complex queries to be defined on the database to reduce the data down to a set of rays which meet some test. Prism library ZEMAX includes a large library of predefined prisms. These objects may be scaled to any size, then placed anywhere. Most common prisms, such as right, dove, roof, penta, pechan, and many others are included.

7 NON-SEQUENTIAL ANALYSIS ZEMAX supports a wide variety of analysis tools and features specific to non-sequential ray tracing. Layouts 3D perspective and shaded model Ray data from saved trace may be used Data queries on rays in layouts to find paths Photometric or Radiometric Illumination Units Watts, Lumens for source flux Watts/Area, Footcandles, Lux, Phot for irradiance Watts/Steradian or Candela for intensity Detectors Incoherent or coherent irradiance/illuminance Radiant or luminous intensity in angle space May be placed anywhere Any faceted object may be a detector Detectors may be viewed in place CAD Import/Export IGES, STEP, and SAT import/export Objects exported and imported as solids Ray Splitting Rays striking surfaces may split into multiple rays Split rays may split again and again Controls on ray energy and number of splits Rays split with correct energy Polarization and thin film coatings accounted for Ray Scattering Specular, Gaussian, Lambertian scattering ABg model scattering for BTDF/BRDF data Multiple rays may be split and scattered off Bulk scattering inside volumes Arbitrary scattering data defined in a catalog Conservation of energy automatically enforced Ray Database Rays traced may be saved in a file Rays may be filtered using a complex query Only rays which pass the query are displayed Paths for any scattered ray may be recreated Gradient Index Any solid volume may be GRIN GRIN media completely arbitrary, user definable GRIN s may be nested inside other GRIN s or voids Diffraction Multiple orders may be traced simultaneously Relative energy in each order user defined Phase profile may be standard or user defined Most objects may have diffractive faces Polarization Sources may be polarized or unpolarized Coherence may be defined for any source Thin films may be applied to each object face

8 PHYSICAL OPTICS PROPAGATION Propagation of light is a coherent process. As the wavefront travels through free space or glass, each part of the wavefront coherently interferes with all the other parts. Modeling this coherent propagation is the realm of physical optics. Physical Optics Propagation (POP) is the ability of ZEMAX to use diffraction calculations to propagate any beam through an optical system surface by surface, including transfer of the beam through almost any ZEMAX surface type. POP is a very extensive and powerful feature. The initial beam is completely arbitrary. Any complex electric field distribution may be modeled. The initial beam may be inserted at any surface in the ZEMAX lens model. The beam is then propagated through any range of surfaces. For every space between optical surfaces, a full diffraction propagation may be computed. At every surface, a transfer function is applied to the beam which accounts for the effects of propagation through the surface. Vignetting, apertures, polarization, thin films, transmission, aberrations, distortion, magnification, and diffraction are all considered. POP may be used to predict aberration correction and transmission from pinhole apertures, Talbot imaging, edge diffraction effects, laser beam propagation, arbitrary fiber mode coupling, Fresnel zone plates, and many others. Beam modeling Optical beams are modeled using numerical arrays. At each point in the array, the complex amplitude electric field is stored. Any amplitude and phase distribution is supported, the feature is not limited to Gaussian beams. The phase of the complex values of the electric field determines the phase of the wavefront relative to a reference surface. The amplitude of the values determines the power of the beam in user selectable power per area units, for example, in watts/centimeter squared. POP supports user selectable array sizes, and the X and Y direction sampling and point to point spacing may be different. Both dimensions change dynamically to best fit the beam during propagation. The initial beam may be defined in any of these ways: Gaussian, may be anamorphic or diverging Uniform amplitude top hat Defined by external user written function Defined by user defined data file Defined by prior POP analysis Once the beam is defined, the propagation direction is determined by aligning the beam to any chief ray. POP supports propagation in any skew direction; the feature is not limited to axial or symmetric beams or systems. Propagation method To propagate the beam from one surface to another, either a Fresnel diffraction propagation or an angular spectrum propagation algorithm is used. ZEMAX automatically chooses the algorithm that yields the highest numerical accuracy. The diffraction propagation algorithms yield correct results for any propagation distance, for any arbitrary beam. As the beam propagates, ZEMAX automatically scales the dimensions of the array to properly fit the beam size. To minimize phase errors, ZEMAX finds the best surface to use for reference of the phase.

9 PHYSICAL OPTICS PROPAGATION Propagating through surfaces The difficulty in implementing a diffraction propagation capability is not the free space beam propagation algorithm. The hard part is propagating through arbitrary optical surfaces. When the beam reaches an optical surface between two media, ZEMAX computes a transfer function between the object and image space sides of the surface. The transfer function accounts for all the effects a surface may have on the beam, including: Phase imparted to the wavefront Aberrations Amplitude transmittance of the surface Polarization and thin film effects Phase due to gratings, binary, or diffractive surfaces Change in beam size, magnification Changes in aspect ratio, due to obliquity or diffraction Vignetting by arbitrary apertures on surfaces Optical power The transfer function is computed using an exact ray trace of the local surface properties. The rays used are called the probing rays. These probing rays are chosen to mimic the local beam properties. The method used is not sensitive to amplitude and phase fluctuations of the actual physical beam for numerical stability. The transfer function accounts for polarization using a polarization ray trace. The orthogonal complex amplitude and phase transfer function is used to model losses and phase rotations caused by thin films on the optical surfaces. Once the surface transfer function is applied, the beam may then propagate to the next optical surface. The surface by surface propagation proceeds through the entire optical system. The transfer function may also optionally be applied to multiple surfaces. This speeds the analysis when diffraction effects are negligible. The coordinate system of the beam travels along the chief ray, and rotates as required at coordinate breaks or tilts. The transfer function may be calculated for all ZEMAX surface types, even user-defined and diffractive surfaces. Support for polarization Unpolarized beams are modeled using a single complex amplitude array. Polarized beams require the propagation of two orthogonally polarized arrays. Each array is propagated independently. At an optical surface, a polarization transfer function is computed and applied to the pair of polarized beams. This comprehensive method accounts for polarization dependent amplitude and phase transmission through coated or uncoated surfaces. POP output ZEMAX can display beam irradiance or phase in correct dimensions and units at any surface in the optical system, using surface, contour, grey scale, false color, or cross section plots, or text listings. Complete beam information at any or all surfaces may be stored as data files for later use. Saved beam files may be used to start propagation analysis in another lens.

10 PHYSICAL OPTICS PROPAGATION POP fiber coupling ZEMAX can determine the coupling efficiency by computing the complex overlap integral between the beam and any arbitrary fiber mode. The fiber mode is defined in the same way the initial beam is; using either a formula, a user supplied arbitrary function, or as a data file. The fiber coupling may be computed at, near, or away from beam focus, in any optical space where the fiber mode may be defined. Comparison of POP with ray tracing Ray tracing is a widely applicable technique for modeling the propagation of light through an optical system, however ray tracing is not appropriate for all modeling tasks. Rays are incoherent in the sense that the path a ray takes during propagation is not affected by the presence or absence of other rays. The modeling of beam propagation via ray tracing is commonly called geometrical optics. The geometric optics features in ZEMAX do support what are traditionally called diffraction calculations, such as the Diffraction PSF and MTF. However, these calculations are based upon geometric ray tracing. Rays are used to propagate through the entire optical system, and the path length of the rays is used to reconstruct the wavefront in image space. A single Fraunhofer diffraction step from exit pupil to image surface is then used to compute the PSF or MTF. When using the geometric optics model, all of the diffraction is assumed to occur in just the last propagation, from the exit pupil to the image. Diffraction that occurs at the lens apertures, and as the beam propagates between the lenses, is ignored. For many optical systems, including most imaging lenses, this simplified model is adequate. For other systems, it is not. POP is based upon diffraction propagation at every surface, not just at the exit pupil. This allows proper consideration of diffraction from lens apertures, and at small apertures such as a pinhole near the focus of an aberrated beam. Geometrical optics cannot predict the aberration removal and energy transfer from a pinhole placed near focus, while POP can. Another example is Gibb s Phenomenon, the intensity and phase ripples present in a beam after passing an aperture. Support for special surfaces Nearly all surfaces ZEMAX supports, including aspheric, diffractive, and user-defined, may be used with the diffraction propagation and transfer algorithms in the POP feature. Surfaces such as gradient index, birefringent, and non-sequential are handled by ray tracing. Rays are traced through the surface to the next surface. The resulting amplitude and phase transfer function is then applied to the beam in place of a full diffraction propagation. For these surfaces, the surface transfer function concept is extended to span multiple surfaces at once, so a range of surfaces is described by a single transfer function. Groups of surfaces to be handled by ray tracing rather than diffraction propagation are user selected.

11 PHYSICAL OPTICS PROPAGATION Integration with ZEMAX POP is fully integrated with ZEMAX. Just use an existing ZE- MAX lens file, define the initial beam parameters, and the propagation proceeds. There is virtually no learning curve for POP. In spite of being one of the most technically advanced features in ZEMAX, POP is very easy to use. Beam data may be viewed as an irradiance (power per area, sometimes called intensity in the laser industry) plot, showing either the unpolarized irradiance or just the X- or Y- polarization component of the beam. Phase plots are also available. Both irradiance and phase may be displayed as cross sections, surfaces, grey scale, false color, or contour maps. Data may be viewed for any surface in the optical system, in linear or logarithmic displays. Beam data from a prior propagation may be displayed in a window. This allows a lengthy propagation calculation to be performed once, then the data reviewed at different surfaces or in a different format rapidly. The beam irradiance at any selected surfaces may also be displayed on a layout plot of the lens. ZEMAX optionally draws the saved beam file for selected surfaces on the layout plot, along with any other optical elements. This tool helps visualization of the beam scale relative to the optics used to control the beam propagation. POP reports the best-fit Gaussian beam parameters to any desired beam. These parameters include size, waist, divergence, Rayleigh range, and beam position relative to the waist. Skew Gaussian beam For quick analysis of Gaussian beams, a subset of POP is available. This feature models a possibly astigmatic Gaussian beam propagating through the lens aligned with any ray, even a skew (non-axial, non-meridional) ray. The feature reports beam size, waist, divergence, Rayleigh range, and beam postion in both X and Y direction orientations. The advantages of the skew Gaussian beam feature are very rapid calculations and the ability to optimize properties of skew Gaussian beams at any surface in the optical system. Applications for POP POP is very general, allowing any arbitrary beam to be quickly propagated through almost any optical system ZEMAX can model. Common applications include: Modeling spatial filtering of aberrations Accounting for diffraction from lens/aperture edges Fiber coupling for coherent physical optics beams Arbitrary laser beam propagation through complex optics Analysis of beam shaping devices Diffraction propagation of beams through lenslet arrays Coherent interaction between propagating beams Correct modeling of diffraction propagation in optical spaces Computing shifts in waist focus position due to aberrations Computing flux and irradiance on optical surfaces

12 OPTIMIZATION Optimization is used to improve the performance of an optical system based upon an initial design. ZEMAX uses a powerful actively damped least squares optimization algorithm. Any number of variables may be simultaneously optimized, using either a user defined or one of the default merit functions. An infinite number of different user defined merit functions may be created using any of the hundreds of predefined controls. Merit functions The 20 default merit functions include minimization of peakto-valley or RMS, of either spot radius, x, y, x + y, or wavefront error, referenced to either the chief ray or the centroid. Other physically significant merit functions are available such as best MTF response or encircled energy. Frequently used merit functions may be stored independently of the lens as an option. The predefined targets include ray and construction data, as well as detailed boundary controls on lens and system data. Other optimization targets include aberration coefficients, macro computations, and many more. The merit function is easily edited and customized. Optimization over multiple configurations is simple and transparent. Equality, inequality, and Lagrange multiplier constraints are all supported with arbitrary weighting. Optimization variables ZEMAX can optimize virtually any parameter in the system, including radii, thickness, glasses, conics, aspheric coefficients, grating spacings, apertures, wavelengths, fields, and more. Non-sequential position and parameter data may also be optimized. Easy to use Optimization is very simple to use. First, define which parameters ZEMAX is free to optimize. Then define a merit function using the default merit function dialog box. Lastly, click on Automatic and ZEMAX does the rest. ZEMAX chooses optimal derivative increments and damping factors automatically at every iteration. ZEMAX can optionally display and update other windows during optimization, which provides valuable feedback on the evolution of the optical system. For even more advanced capability, ZEMAX can optimize any data computed either in a macro or by an externally written program designed to interface with ZEMAX. GLOBAL OPTIMIZATION Global optimization refers to the capability of ZEMAX to seek out not only an improved design but the best possible design available for a given set of goals and constraints. ZEMAX supports two global optimization algorithms. The first algorithm, called global search, is used to seek out new design forms and then optimize them in search of the ten best design forms available. The search runs until terminated by the user. The second algorithm is called hammer optimization and is used for exhaustively searching for a better variation of the current design form. Hammer optimization is used in the final stages of a design effort to verify that the best possible design has indeed been selected. Both algorithms use the same user defined or default merit function as the standard optimization feature, and can be run as background tasks for effortless optimization. ZEMAX supports up to 4 CPU s per computer for automatic multiple threaded execution. Any analysis windows may be automatically updated to monitor the performance of the improved solutions as they are found.

13 TOLERANCING ZEMAX supports a comprehensive, flexible, and powerful integrated tolerance analysis capability. Tolerances are set using a combination of user selectable options. Default tolerances include ranges on radius, fringes, thickness, position, x and y tilt, x and y decenter, irregularity, wedge, glass index, Abbe number, and more. Additional tolerances may be defined, including aspheric constants, decenters/tilts, solve and parameter tolerances, and others. Compensators are defined, including focus, tilt, or position of any optical element, surface, or element group. Any number of user defined tolerances is allowed. A tolerance criteria is then selected. ZEMAX supports RMS spot radius, RMS wavefront error, MTF, boresight error, or a completely user defined criteria. For more complex tolerance analysis, a user defined script may be defined which describes a step-by-step procedure used to align, adjust, and evaluate the lens. The script may change compensators and evaluation criteria during the simulated alignment and compensation process. Finally, ZEMAX conducts an analysis of the tolerances using any or all of these three tools: Sensitivity Analysis The sensitivity analysis considers each defined tolerance independently. Parameters are adjusted to the limits of the tolerance range, and then the optimum value of each compensator is determined. A table is generated listing the contribution of each tolerance to the performance loss. Inverse Sensitivity Analysis The inverse sensitivity analysis iteratively computes the tolerance limits on each parameter when the maximum degradation in performance is defined. Monte Carlo Analysis The Monte Carlo analysis is extremely powerful and useful because all tolerances are considered at once. Random systems are generated using the defined tolerances. Every parameter is randomly perturbed using appropriate statistical models, all compensators are adjusted, and then entire system is evaluated with all defects considered. User defined statistics based upon actual fabrication data is supported. ZEMAX can quickly simulate the fabrication of a huge number of lenses and reports statistics on simulated manufacturing yields. ZOOM AND MULTI-CONFIGURATIONS ZEMAX supports zoom lens analysis and design as a special case of the more general multi-configuration concept. Virtually any parameter in ZEMAX, such as a wavelength, aperture value, field position, radius, thickness, glass type, or other data, may take on multiple values. Each configuration may have different values for many different parameters. This feature can be used to design conventional zoom lenses, scanning systems, athermalized lenses, multiple path systems, interferometers, lens arrays, and beamsplitters. ZEMAX can draw one or all configurations of a system on one plot, either displaced or overlayed at any point in the optical system. Global reference coordinates make it easy to link the locations of various components in the system to one another across configurations. Simultaneous optimization of multiple configurations is also supported. Each configuration may have identical or unique merit functions. Variables and constraints may be common to all configurations or unique to just a few. This powerful feature may also be used to athermalize optical systems by simultaneously optimizing over a range of temperatures.

14 THERMAL ANALYSIS Optical systems which are used over a wide temperature range or in environment different from the standard temperature and pressure require consideration of thermal effects on the index of refraction and material expansion. ZEMAX uses an accurate nonlinear thermal model, not a simple dn/dt approximation. ZEMAX supports specification (and optimization) of the thermal coefficient of expansion (TCE) for spacers between lens elements or groups. The TCE data is used to create multiple configurations which reflect performance at various user defined temperatures. The glass catalogs supported by ZEMAX contain thermal expansion and index variation with temperature and pressure data which are used to compute the effects on individual elements and the optical system as a whole. Since ZEMAX can optimize across multiple configurations simultaneously, this feature can be used to design athermalized lenses, as well as estimate performance changes with temperature. Thermal expansion properties of all ZEMAX surfaces, including aspheric surfaces, are accurately modeled. EXTENDED SOURCE ANALYSIS Point sources are very useful in the design of imaging systems, because the detected image properties of a point source can be used to accurately describe many aspects of image quality. However, extended sources are very useful for visualizing distortion (especially non-radial distortion), checking image orientation or polarity, color separation, and for qualitatively illustrating overall system performance. ZEMAX supports two types of extended sources. A simple ASCII format that is useful for making bar targets, letters, squares, and other simple shapes is supported. For color images ZEMAX supports the standard Windows BMP and JPG formats. Images defined in either format may be used as sources, and the detected image may be viewed for any optical system using user defined detector properties. Once an extended source file is created, it can be scaled, rotated, inverted, and placed at any position in the field. The detected image may be saved as another bitmap for analysis. The extended source imaging features in ZEMAX account for image distortion, aberrations, and transmission, which is generally field, pupil, and wavelength dependent. MACROS AND EXTENSIONS No matter how many features a program has, there often is a need for a custom analysis or computation. ZEMAX supports an extensive macro language called ZPL. ZPL is structured like BASIC, uses commands like PRINT and GOTO, and also adds new keywords such as RAYTRACE and GETMTF that can be used to extract data computed by ZEMAX. ZPL supports function calls, user defined arrays, numeric and string variables, text and graphical output, and a simple interface to the ray tracing algorithms. For more complex analysis jobs, ZEMAX supports a very general programming interface called extensions. ZEMAX is designed to operate in a client-server architecture. ZEMAX can be used to trace rays, do analysis, and optimize, all under the control of an external program. One application for this technology is to provide a user defined feature capability. These features are tightly integrated with the ZEMAX user interface. The extended features appear as menu items, and output is displayed as a standard ZEMAX feature. Extensions are written in C or C++ and provide a compiled program extension capability.

15 POLARIZATION RAY TRACING ZEMAX incorporates a complete polarization ray tracing and analysis capability. Any input polarization state may be defined, and the polarized light may be traced through any optical system. ZEMAX accounts for transmission, reflection, absorption, polarization state, diattenuation, and retardance. Polarization ray tracing requires the computation of surface and bulk material effects. Surface effects depend upon the properties of any thin film optical coatings applied to a surface. Thin films modeling ZEMAX has an extensive thin film modeling capability to support the polarization analysis. Multilayer film dielectric and metallic coatings may be defined, from either a predefined or user defined material database. Coatings may be applied to either dielectric or metallic substrates. Coatings may be composed of arbitrary layers of arbitrary material, each defined with a complex index of refraction, with full dispersion modeling in the coating materials. Substrates may be glass, metallic, or user defined. ZEMAX automatically reverses the coating layer order if surfaces go from air to glass then glass to air, so the same coating may be applied on many surfaces without the need to define mirror image coatings. With the coating data in place, ZEMAX computes the diattenuation, phase, retardance, reflection, transmission, or absorption of any coating as a function of wavelength or angle. Material modeling Bulk absorption is modeled in detail in ZEMAX, including transmission through any thickness of glass at any wavelength. Bulk absorption generally attenuates a ray, and the amount of attenuation depends upon the ray path length, material properties, and wavelength. Any material may have user defined absorption or transmission properties. Polarization data ZEMAX allows definition of either an unpolarized or polarized input beam. Rays are then traced and ZEMAX keeps track of the electric field vector in 3D space, including the S and P components at every surface intercept. Transmission and polarization vector properties are modeled in detail. Polarization ray tracing results may be presented in tables, or may be summarized by graphical displays. BIREFRINGENT MATERIALS ZEMAX models birefringent uniaxial crystals such as Calcite. These materials are complex to ray trace through because the ray refraction angle depends upon the material index of refraction, as is usually the case, but the effective index of the media is a complex function of the angle the ray makes in the media with respect to both the surface normal and the crystal axis vector. ZEMAX supports a fully 3D treatment which correctly propagates rays and computes correct phase for any polarization state, at any angle of incidence, for arbitrary orientation of the crystal axis vector, with no restrictions. Even polarization transmitted intensity is properly accounted for. Both the ordinary and extraordinary paths may be computed, and ZEMAX allows complete dispersion modeling for both the ordinary and extraordinary index of refraction. A library of birefringent materials is included, and new materials of arbitrary dispersion may be user defined.

16 SEQUENTIAL FEATURE SUMMARY SE XE EE GENERAL 3D optics placement (tilts, decenters, rotations) Unlimited number of surfaces, variables, optimization targets, etc. SOURCE TYPES Point, diode, elliptical, extended, uniform, Gaussian, Lambertian Define field points using angles, object heights, real or paraxial image heights SURFACE TYPES Spheres, aspheres, conics, polynomial aspheres Cylinders, toroids, x-y polynomials, splines, axicons, biconics Holograms, diffraction gratings, paraxial lenses, ABCD surfaces, Fresnel Circular, rectangular, elliptical, and spider apertures Gradient index lenses Generalized non-symmetric binary/diffractive optics, Zernike surfaces Elliptical and VLS gratings, extended splines Birefringent, user defined, and other selected special surface types OPTIMIZATION Damped least squares algorithm with 20 default merit functions Global optimization, MTF and diffraction encircled energy optimization Optimization of macro or compiled extension computations TOLERANCING Tolerancing of tilts, decenters, all construction parameters, glass properties RMS spot size, wavefront, boresight, MTF, user defined criterion Sensitivity, inverse sensitivity, and Monte Carlo analysis Tolerance using a procedure script TOOLS Ghost focus generation; 1 and 2 surface bounces Export IGES, SAT, and STEP solid model data for CAD programs ZPL macro language Compiled user defined features ANALYSIS Layouts, element drawings, aberration fans, relative illumination Spot diagrams, encircled energy, Y-Ybar, MTF, PSF Image analysis, intensity histograms, user defined source imaging Interferograms, chromatic shift, field curvature and distortion, many more! Polarization ray tracing, thin films analysis Thermal optimization and analysis, TCE, dn/dt Physical Optics Propagation NON-SEQUENTIAL FEATURE SUMMARY (ZEMAX-EE ONLY) GENERAL SOURCE TYPES OBJECT TYPES TOOLS ANALYSIS 3D optics placement in a global coordinate system, with optional linking of object positions Unlimited number of sources, objects, detectors, rays, etc. Point, diode, elliptical, rectangular, filament, volume, surface, Radiant Source TM, user defined Triangles, rectangles, ellipses, cones, cylinders, pipes, torus, surfaces, prisms Fresnel lenses, conventional lenses, aspheres, toroids, cylinders, MEMS, CPC Diffractive optics, holograms, gratings, user defined objects and prisms Objects imported from CAD programs in IGES, SAT, STEP, or STL format Objects may be multiply nested, or in contact (glued) Media may be arbitrary glass, gradient index, absorbing, reflecting, scattering, or diffracting Thin film coatings may be placed on any face of any object, or between any objects Export IGES, SAT, and STEP solid model data for CAD programs Detected energy may be viewed at any position anywhere in the model Coherent and incoherent irradiance, intensity plots (power/solid angle) Rays may split at any boundary into an arbitrary number of child rays Bulk and/or surface scattering on any object Rays for multiple orders of diffractive optics may be simultaneously traced Rays may be traced once and saved to a database for subsequent analysis Radiometric units (watts) or photometric units (Lumens, Candela, Phot, Footcandle, etc.)

17 易迪拓培训 专注于微波 射频 天线设计人才的培养网址 : 射频和天线设计培训课程推荐 易迪拓培训 ( 由数名来自于研发第一线的资深工程师发起成立, 致力并专注于微波 射频 天线设计研发人才的培养 ; 我们于 2006 年整合合并微波 EDA 网 ( 现已发展成为国内最大的微波射频和天线设计人才培养基地, 成功推出多套微波射频以及天线设计经典培训课程和 ADS HFSS 等专业软件使用培训课程, 广受客户好评 ; 并先后与人民邮电出版社 电子工业出版社合作出版了多本专业图书, 帮助数万名工程师提升了专业技术能力 客户遍布中兴通讯 研通高频 埃威航电 国人通信等多家国内知名公司, 以及台湾工业技术研究院 永业科技 全一电子等多家台湾地区企业 易迪拓培训课程列表 : 射频工程师养成培训课程套装该套装精选了射频专业基础培训课程 射频仿真设计培训课程和射频电路测量培训课程三个类别共 30 门视频培训课程和 3 本图书教材 ; 旨在引领学员全面学习一个射频工程师需要熟悉 理解和掌握的专业知识和研发设计能力 通过套装的学习, 能够让学员完全达到和胜任一个合格的射频工程师的要求 课程网址 : ADS 学习培训课程套装该套装是迄今国内最全面 最权威的 ADS 培训教程, 共包含 10 门 ADS 学习培训课程 课程是由具有多年 ADS 使用经验的微波射频与通信系统设计领域资深专家讲解, 并多结合设计实例, 由浅入深 详细而又全面地讲解了 ADS 在微波射频电路设计 通信系统设计和电磁仿真设计方面的内容 能让您在最短的时间内学会使用 ADS, 迅速提升个人技术能力, 把 ADS 真正应用到实际研发工作中去, 成为 ADS 设计专家... 课程网址 : HFSS 学习培训课程套装该套课程套装包含了本站全部 HFSS 培训课程, 是迄今国内最全面 最专业的 HFSS 培训教程套装, 可以帮助您从零开始, 全面深入学习 HFSS 的各项功能和在多个方面的工程应用 购买套装, 更可超值赠送 3 个月免费学习答疑, 随时解答您学习过程中遇到的棘手问题, 让您的 HFSS 学习更加轻松顺畅 课程网址 : `

18 易迪拓培训 专注于微波 射频 天线设计人才的培养网址 : CST 学习培训课程套装该培训套装由易迪拓培训联合微波 EDA 网共同推出, 是最全面 系统 专业的 CST 微波工作室培训课程套装, 所有课程都由经验丰富的专家授课, 视频教学, 可以帮助您从零开始, 全面系统地学习 CST 微波工作的各项功能及其在微波射频 天线设计等领域的设计应用 且购买该套装, 还可超值赠送 3 个月免费学习答疑 课程网址 : HFSS 天线设计培训课程套装套装包含 6 门视频课程和 1 本图书, 课程从基础讲起, 内容由浅入深, 理论介绍和实际操作讲解相结合, 全面系统的讲解了 HFSS 天线设计的全过程 是国内最全面 最专业的 HFSS 天线设计课程, 可以帮助您快速学习掌握如何使用 HFSS 设计天线, 让天线设计不再难 课程网址 : MHz NFC/RFID 线圈天线设计培训课程套装套装包含 4 门视频培训课程, 培训将 13.56MHz 线圈天线设计原理和仿真设计实践相结合, 全面系统地讲解了 13.56MHz 线圈天线的工作原理 设计方法 设计考量以及使用 HFSS 和 CST 仿真分析线圈天线的具体操作, 同时还介绍了 13.56MHz 线圈天线匹配电路的设计和调试 通过该套课程的学习, 可以帮助您快速学习掌握 13.56MHz 线圈天线及其匹配电路的原理 设计和调试 详情浏览 : 我们的课程优势 : 成立于 2004 年,10 多年丰富的行业经验, 一直致力并专注于微波射频和天线设计工程师的培养, 更了解该行业对人才的要求 经验丰富的一线资深工程师讲授, 结合实际工程案例, 直观 实用 易学 联系我们 : 易迪拓培训官网 : 微波 EDA 网 : 官方淘宝店 : 专注于微波 射频 天线设计人才的培养易迪拓培训官方网址 : 淘宝网店 :

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