Development of EUV-Scatterometry for CD Characterization of Masks. Frank Scholze, Gerhard Ulm Physikalisch-Technische Bundesanstalt, Berlin, Germany
|
|
- Zoe Alexander
- 6 years ago
- Views:
Transcription
1 Development of EUV-Scatterometry for CD Characterization of Masks PB Frank Scholze, Gerhard Ulm Physikalisch-Technische Bundesanstalt, Berlin, Germany Jan Perlich, Frank-Michael Kamm, Jenspeter Rau nfineon Technologies, München, Germany Christian Holfeld Advanced Mask Technology Center, Dresden, Germany 2nd nternational EUVL Symposium, 30 September - 2 October 2003
2 Outline PB Motivation EUV measurement facilities at PTB/BESSY, Berlin Scatterometry of topographical masks Comparison to simulation Conclusions 2nd nternational EUVL Symposium, 30 September - 2 October 2003
3 Co-Operation nfineon-ptb PB ssue: Complex image formation of EUV masks requires accurate measurement of topographical structure. Partners: nfineon Maskhouse Munich as a leading-edge maskshop for advanced photomasks. PTB as leading provider of EUV metrology capabilities. Goal: evaluate applicability of EUV-scatterometry. Future activities on EUV masks will be performed by the new Advanced Mask Technology Center (AMTC), Dresden. 2nd nternational EUVL Symposium, 30 September - 2 October 2003
4 PTB Radiometry Laboratory PB BESSY main parameters diameter of experimental hall: 120 m circumference of storage ring: 240 m 2nd nternational EUVL Symposium, 30 September - 2 October 2003
5 PTB Radiometry Laboratory PB 5 PTB Undulator 4c bending magnets electrons 3c 4b 4a 3a 2 3b 65 m 1 plane grating monochromator 4a undispersed undulator radiation 30 ev to 1800 ev 2 four crystal monochromator 1.75 kev to 10 kev 4b plane grating monochromator at undulator 20 ev to 1900 ev 3a undispersed bending magnet radiation 4c deflected undispersed undulator radiation 3b normal incidence monochromator radiation source calibration 3 ev to 35 ev 5 normal incidence monochromator detector calibration 3 ev to 35 ev 3c deflected undispersed bending magnet radiation 2nd nternational EUVL Symposium, 30 September - 2 October
6 EUV Activities PB Radiometry beamline: reflectometry rel. uncert. reflectance: u=0.14% detector calibration rel. uncert. responsivity: u=0.3% Focused bending magnet: optics lifetime-testing Direct undulator radiation: system metrology, first European EUV prints with MET 2nd nternational EUVL Symposium, 30 September - 2 October 2003
7 PB PTB Reflectometer Det- R 2Θ Det- X Det. Φ Θ z Φ y x tilt Axis θ Tilt φ x y z Det. X Det. R Det. φ 2θ θ Range -30 to to 10 0 to mm to 90 mm -10 mm to 300 mm -15 mm to 140 mm 0 mm to 120 mm 150 mm to 550 mm 0 to to 190 Accuracy: 10µm or 0.01 Diameter: 2 m Length: 2.1 m Weight: 3 t 2nd nternational EUVL Symposium, 30 September - 2 October 2003
8 PTB Reflectometer Sample Holder PB Mask 1 ML Mirror Transfer with robot 2nd nternational EUVL Symposium, 30 September - 2 October 2003
9 Motivation PB Complex image formation of EUV masks requires accurate measurement of topographical structure, e.g. sidewall angle. Optical scatterometry already used for fast characterization of mask topography, but limited to optical spectrum. Extension to shorter wavelengths desirable due to resolution. Actinic measurement needed to provide further information on mask performance, e.g. local EUV-reflectance in patterned region. 2nd nternational EUVL Symposium, 30 September - 2 October 2003
10 Scattering Theory PB Fraunhofer diffraction at a planar structure ( θ ) = ( ) 0 sin β sin N α 2 N β sinα 2 2 Form factor: information on CD q β = π CD x 2π Diffraction lines: information on pitch q x = 2π/pitch q x = 2π/CD q α = π pitch x 2π 2nd nternational EUVL Symposium, 30 September - 2 October 2003
11 Scatterometry of Lines & Spaces PB Scan of the direction of the outgoing photon beam at constant wavelength significant variation of q z 2nd nternational EUVL Symposium, 30 September - 2 October 2003
12 Theory - Scattering with Depth Profile PB Diffracted orders ncident beam at 5 CDeff Effective reflection depth 3D mask structure of EUV masks : Shadowing effects due to oblique angle of incidence effective CD Reflection at distributed Bragg-reflector effective plane of reflection Effective geometrical model : reduced CD at large scattering angles due to shadowing. 2nd nternational EUVL Symposium, 30 September - 2 October 2003
13 Comparison to Rigorous Modelling PB γ var Cr CD var SiO 2 CD: 412 nm, 35 absorber angle Rigorous modeling of topographical mask: ❶ Calculate intensity of diffraction orders with rigorous coupled wave analyis. ❶ Best-fit to experimental data. Extraction of bottom-cd, and absorber- sidewall angle. 2nd nternational EUVL Symposium, 30 September - 2 October 2003
14 Conclusions PB ❶ High-accuray reflectometry used to measure EUV-scattering. ❶ EUV-scatteromtery provides topographical information of multilayer masks. ❶ High-accuray EUV-scatterometry provides a tool for testing EUV mask modelling. ❶ Further development aims for optimized measurement procedures, improved modelling and fast automated fitting. 2nd nternational EUVL Symposium, 30 September - 2 October 2003
Optics Vac Work MT 2008
Optics Vac Work MT 2008 1. Explain what is meant by the Fraunhofer condition for diffraction. [4] An aperture lies in the plane z = 0 and has amplitude transmission function T(y) independent of x. It is
More informationGeometric Field Tracing through an Off- Axis Parabolic Mirror
UseCase.0077 (1.0) Geometric Field Tracing through an Off- Axis Parabolic Mirror Keywords: focus, geometric field tracing, diffractive field tracing Description This use case explains the usage of the
More informationMeasurement and characterization of EUV mask performance at high-na
Measurement and characterization of EUV mask performance at high-na Rikon Chao Andrew R. Neureuther, Ed. Laura Waller, Ed. Patrick Naulleau, Ed. Electrical Engineering and Computer Sciences University
More informationSCDI for EUV photomask metrology RESCAN - Reflective EUV Mask Scanning Lensless Imaging Tool
EUV Litho Workshop 2017 WIR SCHAFFEN WISSEN HEUTE FÜR MORGEN P. Helfenstein a, I. Mochi a, R. Rajendran a, S. Fernandez a, S. Yoshitake b, Y. Ekinci a a Paul Scherrer Institut, Switzerland b NuFlare Technology
More informationarxiv: v1 [physics.optics] 11 Nov 2010
Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis arxiv:1011.2665v1 [physics.optics] 11 Nov 2010 Jan Pomplun ab, Sven Burger ab, Frank Schmidt ab, Frank Scholze c, Christian Laubis
More informationDiffraction Diffraction occurs when light waves pass through an aperture Huygen's Principal: each point on wavefront acts as source of another wave
Diffraction Diffraction occurs when light waves pass through an aperture Huygen's Principal: each point on wavefront acts as source of another wave If light coming from infinity point source at infinity
More informationspecular diffuse reflection.
Lesson 8 Light and Optics The Nature of Light Properties of Light: Reflection Refraction Interference Diffraction Polarization Dispersion and Prisms Total Internal Reflection Huygens s Principle The Nature
More informationLecture 4. Physics 1502: Lecture 35 Today s Agenda. Homework 09: Wednesday December 9
Physics 1502: Lecture 35 Today s Agenda Announcements: Midterm 2: graded soon» solutions Homework 09: Wednesday December 9 Optics Diffraction» Introduction to diffraction» Diffraction from narrow slits»
More informationSupplementary Figure 1 Optimum transmissive mask design for shaping an incident light to a desired
Supplementary Figure 1 Optimum transmissive mask design for shaping an incident light to a desired tangential form. (a) The light from the sources and scatterers in the half space (1) passes through the
More informationControl of Light. Emmett Ientilucci Digital Imaging and Remote Sensing Laboratory Chester F. Carlson Center for Imaging Science 8 May 2007
Control of Light Emmett Ientilucci Digital Imaging and Remote Sensing Laboratory Chester F. Carlson Center for Imaging Science 8 May 007 Spectro-radiometry Spectral Considerations Chromatic dispersion
More informationTo see how a sharp edge or an aperture affect light. To analyze single-slit diffraction and calculate the intensity of the light
Diffraction Goals for lecture To see how a sharp edge or an aperture affect light To analyze single-slit diffraction and calculate the intensity of the light To investigate the effect on light of many
More informationMEMS SENSOR FOR MEMS METROLOGY
MEMS SENSOR FOR MEMS METROLOGY IAB Presentation Byungki Kim, H Ali Razavi, F. Levent Degertekin, Thomas R. Kurfess 9/24/24 OUTLINE INTRODUCTION Motivation Contact/Noncontact measurement Optical interferometer
More informationChallenges in Manufacturing of optical and EUV Photomasks Martin Sczyrba
Challenges in Manufacturing of optical and EUV Photomasks Martin Sczyrba Advanced Mask Technology Center Dresden, Germany Senior Member of Technical Staff Advanced Mask Technology Center Dresden Key Facts
More informationUniversity Physics (Prof. David Flory) Chapt_37 Monday, August 06, 2007
Name: Date: 1. If we increase the wavelength of the light used to form a double-slit diffraction pattern: A) the width of the central diffraction peak increases and the number of bright fringes within
More informationAutocollimator Calibration for Synchrotron Metrology: Advancing from Plane to Solid Angle
Autocollimator Calibration for Synchrotron Metrology: Advancing from Plane to Solid Angle Ralf D. Geckeler, Oliver Kranz, Andreas Just, Michael Krause PTB - Physikalisch-Technische Bundesanstalt, Germany
More informationA raytracing code for zone plates
A raytracing code for zone plates Alexei Erko *, Franz Schaefers, Nikolay Artemiev a BESSY GmbH, Albert-Einstein-Str.15, 12489 Berlin, Germany a Laboratoire d'optique Appliquee ENSTA Ecole Polytechnique
More informationModels of Light The wave model: The ray model: The photon model:
Models of Light The wave model: under many circumstances, light exhibits the same behavior as sound or water waves. The study of light as a wave is called wave optics. The ray model: The properties of
More informationDefect Repair for EUVL Mask Blanks
Defect Repair for EUVL Mask Blanks A.Barty, S.Hau-Riege, P.B.Mirkarimi, D.G.Stearns, H.Chapman, D.Sweeney Lawrence Livermore National Laboratory M.Clift Sandia National Laboratory E.Gullikson, M.Yi Lawrence
More informationSoft X-Ray Reflectivity: from quasi-perfect mirrors to accelerator walls. Franz Schäfers Institute for Nanometre Optics and Technology (INT)
Soft X-Ray Reflectivity: from quasi-perfect mirrors to accelerator walls Franz Schäfers Institute for Nanometre Optics and Technology (INT) Synchrotron Radiation in all colours Charged particles, moving
More informationChapter 24. Wave Optics. Wave Optics. The wave nature of light is needed to explain various phenomena
Chapter 24 Wave Optics Wave Optics The wave nature of light is needed to explain various phenomena Interference Diffraction Polarization The particle nature of light was the basis for ray (geometric) optics
More informationLecture 39. Chapter 37 Diffraction
Lecture 39 Chapter 37 Diffraction Interference Review Combining waves from small number of coherent sources double-slit experiment with slit width much smaller than wavelength of the light Diffraction
More informationEffective Medium Theory, Rough Surfaces, and Moth s Eyes
Effective Medium Theory, Rough Surfaces, and Moth s Eyes R. Steven Turley, David Allred, Anthony Willey, Joseph Muhlestein, and Zephne Larsen Brigham Young University, Provo, Utah Abstract Optics in the
More informationHigh spatial resolution measurement of volume holographic gratings
High spatial resolution measurement of volume holographic gratings Gregory J. Steckman, Frank Havermeyer Ondax, Inc., 8 E. Duarte Rd., Monrovia, CA, USA 9116 ABSTRACT The conventional approach for measuring
More informationChapter 24. Wave Optics. Wave Optics. The wave nature of light is needed to explain various phenomena
Chapter 24 Wave Optics Wave Optics The wave nature of light is needed to explain various phenomena Interference Diffraction Polarization The particle nature of light was the basis for ray (geometric) optics
More informationLenses lens equation (for a thin lens) = (η η ) f r 1 r 2
Lenses lens equation (for a thin lens) 1 1 1 ---- = (η η ) ------ - ------ f r 1 r 2 Where object o f = focal length η = refractive index of lens material η = refractive index of adjacent material r 1
More informationTHE INFLUENCE OF SURFACE ROUGHNESS ON THE REFRACTION OF X-RAYS AND ITS EFFECT ON BRAGG PEAK POSITIONS
Copyright JCPDS - International Centre for Diffraction Data 2003, Advances in X-ray Analysis, Volume 46. 232 THE INFLUENCE OF SURFACE ROUGHNESS ON THE REFRACTION OF X-RAYS AND ITS EFFECT ON BRAGG PEAK
More informationElectricity & Optics
Physics 24100 Electricity & Optics Lecture 27 Chapter 33 sec. 7-8 Fall 2017 Semester Professor Koltick Clicker Question Bright light of wavelength 585 nm is incident perpendicularly on a soap film (n =
More informationChapter 24. Wave Optics
Chapter 24 Wave Optics Diffraction Huygen s principle requires that the waves spread out after they pass through slits This spreading out of light from its initial line of travel is called diffraction
More informationRalf K. Heilmann CAT-GS: Critical-Angle Transmission Grating Spectrometer January 27,
Ralf K. Heilmann CAT-GS: Critical-Angle Transmission Grating Spectrometer January 27, 2009 1 Overview of CAT-GS Mission requirements: Effective area > 1000 cm 2 (0.3 1 kev) Spectral resolution E/ΔE > 3000
More informationDeflecting & Shuttering Laser Beams Often need to scan laser beam over an area Also need change CW or long pulse to short pulse Use motor driven
Deflecting & Shuttering Laser Beams Often need to scan laser beam over an area Also need change CW or long pulse to short pulse Use motor driven mirror system Scanning mirror systems: 1 or 2 axis scanners
More informationAnalysis of Slanted Gratings for Lightguide Coupling
Analysis of Slanted Gratings for Lightguide Coupling Abstract Slanted gratings are commonly used for coupling light into optical lightguides due to their high efficiency in a certain diffraction order.
More informationSCINTILLATORS-SiPM COUPLING
SCINTILLATORS-SiPM COUPLING G.FELICI LNF-INFN SCINTILLATOR ßàSIPM 1 st PROBLEM: EJ-200 peak emission spectrum do not match S18825 peak sensitivity AMPLITUDE 1.0 0.8 0.6 0.4 0.2 EJ-200 EMISSION SPECTRUM
More informationDiffraction and Interference of Plane Light Waves
PHY 92 Diffraction and Interference of Plane Light Waves Diffraction and Interference of Plane Light Waves Introduction In this experiment you will become familiar with diffraction patterns created when
More informationInterference. Electric fields from two different sources at a single location add together. The same is true for magnetic fields at a single location.
Interference Electric fields from two different sources at a single location add together. The same is true for magnetic fields at a single location. Thus, interacting electromagnetic waves also add together.
More informationOPC flare and optical modeling requirements for EUV
OPC flare and optical modeling requirements for EUV Lena Zavyalova, Kevin Lucas, Brian Ward*, Peter Brooker Synopsys, Inc., Austin, TX, USA 78746 *Synopsys assignee to IMEC, Leuven, Belgium B3001 1 Abstract
More informationDiffraction from small and large circular apertures
Diffraction from small and large circular apertures Far-field intensity pattern from a small aperture Recall the Scale Theorem! This is the Uncertainty Principle for diffraction. Far-field intensity pattern
More informationChapter 2: Wave Optics
Chapter : Wave Optics P-1. We can write a plane wave with the z axis taken in the direction of the wave vector k as u(,) r t Acos tkzarg( A) As c /, T 1/ and k / we can rewrite the plane wave as t z u(,)
More informationd has a relationship with ψ
Principle of X-Ray Stress Analysis Metallic materials consist of innumerable crystal grains. Each grain usually faces in a random direction. When stress is applied on such materials, the interatomic distance
More informationE x Direction of Propagation. y B y
x E x Direction of Propagation k z z y B y An electromagnetic wave is a travelling wave which has time varying electric and magnetic fields which are perpendicular to each other and the direction of propagation,
More informationMichelson Interferometer
Michelson Interferometer The Michelson interferometer uses the interference of two reflected waves The third, beamsplitting, mirror is partially reflecting ( half silvered, except it s a thin Aluminum
More informationChapter 38. Diffraction Patterns and Polarization
Chapter 38 Diffraction Patterns and Polarization Diffraction Light of wavelength comparable to or larger than the width of a slit spreads out in all forward directions upon passing through the slit This
More informationPhysical Optics. 1 st year physics laboratories. University of Ottawa.
Physical Optics 1 st year physics laboratories University of Ottawa https://uottawa.brightspace.com/d2l/home INTRODUCTION Physical optics deals with light as a wave which can bend around obstacles (diffraction)
More informationDiffraction-based approaches to the in-situ measurement of dimensional variations in components produced by thermoplastic micro- and nano-embossing
Diffraction-based approaches to the in-situ measurement of dimensional variations in components produced by thermoplastic micro- and nano-embossing Hayden Taylor and Duane Boning 23 January 2008 Microsystems
More informationHolographic Elements in Solar Concentrator and Collection Systems
Holographic Elements in Solar Concentrator and Collection Systems Raymond K. Kostuk,2, Jose Castro, Brian Myer 2, Deming Zhang and Glenn Rosenberg 3 Electrical and Computer Engineering, Department University
More informationExtreme Ultraviolet Phase Contrast Imaging
Extreme Ultraviolet Phase Contrast Imaging Gregory Denbeaux 1, Rashi Garg 1, Andy Aquila 2, Anton Barty 3, Kenneth Goldberg 2, Eric Gullikson 2, Yanwei Liu 2, Obert Wood 4 1, University at Albany, Albany,
More informationCondenser Optics for Dark Field X-Ray Microscopy
Condenser Optics for Dark Field X-Ray Microscopy S. J. Pfauntsch, A. G. Michette, C. J. Buckley Centre for X-Ray Science, Department of Physics, King s College London, Strand, London WC2R 2LS, UK Abstract.
More informationTo determine the wavelength of laser light using single slit diffraction
9 To determine the wavelength of laser light using single slit diffraction pattern 91 Apparatus: Helium-Neon laser or diode laser, a single slit with adjustable aperture width, optical detector and power
More informationAdvanced modelling of gratings in VirtualLab software. Site Zhang, development engineer Lignt Trans
Advanced modelling of gratings in VirtualLab software Site Zhang, development engineer Lignt Trans 1 2 3 4 Content Grating Order Analyzer Rigorous Simulation of Holographic Generated Volume Grating Coupled
More informationMultilayer EUV optics with integrated IR suppression gratings
Multilayer EUV optics with integrated IR suppression gratings Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler optix fab GmbH Uwe Zeitner, Robert Leitel, Hans-Christoph Eckstein, Philipp Schleicher,
More informationStructural Colours through Photonic Crystals
Structural Colours through Photonic Crystals R.C. McPhedran, N. Nicorovici, D. R. McKenzie, G. Rouse and M.Large, University of Sydney, L.C. Botten, University of Technology Sydney, A. Parker, V. Welch,
More informationLayered media and photonic crystals. Cord Arnold / Anne L Huillier
Layered media and photonic crystals Cord Arnold / Anne L Huillier Definition A photonic crystal is a periodic arrangement of a dielectric material that exhibits strong interaction with light Variation
More informationDynamical Theory of X-Ray Diffraction
Dynamical Theory of X-Ray Diffraction ANDRE AUTHIER Universite P. et M. Curie, Paris OXFORD UNIVERSITY PRESS Contents I Background and basic results 1 1 Historical developments 3 1.1 Prologue 3 1.2 The
More informationLIGHT SCATTERING THEORY
LIGHT SCATTERING THEORY Laser Diffraction (Static Light Scattering) When a Light beam Strikes a Particle Some of the light is: Diffracted Reflected Refracted Absorbed and Reradiated Reflected Refracted
More informationModelling line edge roughness in periodic line-space structures by Fourier optics to improve scatterometry
J. Europ. Opt. Soc. Rap. Public. 9, 143 (14) www.jeos.org Modelling line edge roughness in periodic line-space structures by Fourier optics to improve scatterometry H. Gross hermann.gross@ptb.de Department
More informationAPPLICATION OF Ni/C-GÖBEL MIRRORS AS PARALLEL BEAM X-RAY OPTICS FOR Cu Ka AND Mo Ka RADIATION
Copyright(c)JCPDS-International Centre for Diffraction Data 2000,Advances in X-ray Analysis,Vol.43 212 APPLICATION OF Ni/C-GÖBEL MIRRORS AS PARALLEL BEAM X-RAY OPTICS FOR AND RADIATION T. Holz, R. Dietsch,
More informationPHYS 3410/6750: Modern Optics Midterm #2
Name: PHYS 3410/6750: Modern Optics Midterm #2 Wednesday 16 November 2011 Prof. Bolton Only pen or pencil are allowed. No calculators or additional materials. PHYS 3410/6750 Fall 2011 Midterm #2 2 Problem
More informationaxis, and wavelength tuning is achieved by translating the grating along a scan direction parallel to the x
Exponential-Grating Monochromator Kenneth C. Johnson, October 0, 08 Abstract A monochromator optical design is described, which comprises a grazing-incidence reflection and two grazing-incidence mirrors,
More informationACCURATE TEXTURE MEASUREMENTS ON THIN FILMS USING A POWDER X-RAY DIFFRACTOMETER
ACCURATE TEXTURE MEASUREMENTS ON THIN FILMS USING A POWDER X-RAY DIFFRACTOMETER MARK D. VAUDIN NIST, Gaithersburg, MD, USA. Abstract A fast and accurate method that uses a conventional powder x-ray diffractometer
More informationChapter 36. Diffraction. Dr. Armen Kocharian
Chapter 36 Diffraction Dr. Armen Kocharian Diffraction Light of wavelength comparable to or larger than the width of a slit spreads out in all forward directions upon passing through the slit This phenomena
More informationExperiment 8 Wave Optics
Physics 263 Experiment 8 Wave Optics In this laboratory, we will perform two experiments on wave optics. 1 Double Slit Interference In two-slit interference, light falls on an opaque screen with two closely
More informationLight. Form of Electromagnetic Energy Only part of Electromagnetic Spectrum that we can really see
Light Form of Electromagnetic Energy Only part of Electromagnetic Spectrum that we can really see Facts About Light The speed of light, c, is constant in a vacuum. Light can be: REFLECTED ABSORBED REFRACTED
More informationChapter 38 Wave Optics (II)
Chapter 38 Wave Optics (II) Initiation: Young s ideas on light were daring and imaginative, but he did not provide rigorous mathematical theory and, more importantly, he is arrogant. Progress: Fresnel,
More informationMID: Materials Imaging and Dynamics Instrument
MID: Materials Imaging and Dynamics Instrument A. Madsen 1,*, J. Hallmann 1, T. Roth 1, G. Ansaldi 1, W. Lu 1,2 1 European XFEL 2 Technische Universität Berlin * anders.madsen@xfel.eu XFEL User Meeting
More informationdq dt I = Irradiance or Light Intensity is Flux Φ per area A (W/m 2 ) Φ =
Radiometry (From Intro to Optics, Pedrotti -4) Radiometry is measurement of Emag radiation (light) Consider a small spherical source Total energy radiating from the body over some time is Q total Radiant
More informationTime-Resolved measurements by FEL spontaneous emission: A proposal for sub-picosecond pumps & probe structural and spectrometric investigations
Time-Resolved measurements by FEL spontaneous emission: A proposal for sub-picosecond pumps & probe structural and spectrometric investigations V. Rossi Albertini, B. Paci & P. Perfetti Istituto di Struttura
More informationPHYSICS. Chapter 33 Lecture FOR SCIENTISTS AND ENGINEERS A STRATEGIC APPROACH 4/E RANDALL D. KNIGHT
PHYSICS FOR SCIENTISTS AND ENGINEERS A STRATEGIC APPROACH 4/E Chapter 33 Lecture RANDALL D. KNIGHT Chapter 33 Wave Optics IN THIS CHAPTER, you will learn about and apply the wave model of light. Slide
More informationLecture 16 Diffraction Ch. 36
Lecture 16 Diffraction Ch. 36 Topics Newtons Rings Diffraction and the wave theory Single slit diffraction Intensity of single slit diffraction Double slit diffraction Diffraction grating Dispersion and
More informationG3 TWO-SOURCE INTERFERENCE OF WAVES
G3 TWO-SOURCE INTERFERENCE OF WAVES G4 DIFFRACTION GRATINGS HW/Study Packet Required: READ Tsokos, pp 624-631 SL/HL Supplemental: Hamper, pp 424-428 DO Questions pp 631-632 #1,3,8,9,10 REMEMBER TO. Work
More informationStudy of Air Bubble Induced Light Scattering Effect On Image Quality in 193 nm Immersion Lithography
Study of Air Bubble Induced Light Scattering Effect On Image Quality in 193 nm Immersion Lithography Y. Fan, N. Lafferty, A. Bourov, L. Zavyalova, B. W. Smith Rochester Institute of Technology Microelectronic
More informationWave Phenomena Physics 15c. Lecture 19 Diffraction
Wave Phenomena Physics 15c Lecture 19 Diffraction What We Did Last Time Studied interference > waves overlap Amplitudes add up Intensity = (amplitude) does not add up Thin-film interference Reflectivity
More informationPhysical Optics. You can observe a lot just by watching. Yogi Berra ( )
Physical Optics You can observe a lot just by watching. Yogi Berra (1925-2015) OBJECTIVES To observe some interference and diffraction phenomena with visible light. THEORY In a previous experiment you
More informationChapter 36. Diffraction. Copyright 2014 John Wiley & Sons, Inc. All rights reserved.
Chapter 36 Diffraction Copyright 36-1 Single-Slit Diffraction Learning Objectives 36.01 Describe the diffraction of light waves by a narrow opening and an edge, and also describe the resulting interference
More informationImage Degradation due to Phase Effects in Chromeless Phase Lithography
Image Degradation due to Phase Effects in Chromeless Phase Lithography Karsten Bubke *, Martin Sczyrba, KT Park, Ralf Neubauer, Rainer Pforr 2, Jens Reichelt 2, Ralf Ziebold 2 Advanced Mask Technology
More informationLUSI SUB-SYSTEM XCS Physics Requirements for the LUSI Large Offset Monochromator. Doc. No. SP R0
PHYSICS REQUIREMENT DOCUMENT (PRD) Doc. No. SP-391-00-16 R0 LUSI SUB-SYSTEM XCS Physics Requirements for the Aymeric Robert Author, LUSI Scientist Signature Date David Fritz LUSI Scientist Signature Date
More informationWhere n = 0, 1, 2, 3, 4
Syllabus: Interference and diffraction introduction interference in thin film by reflection Newton s rings Fraunhofer diffraction due to single slit, double slit and diffraction grating Interference 1.
More information12/7/2012. Biomolecular structure. Diffraction, X-ray crystallography, light- and electron microscopy. CD spectroscopy, mass spectrometry
phase difference at a given distance constructive/destructive interference Biomolecular structure. Diffraction, X-ray crystallography, light- and electron microscopy. CD spectroscopy, mass spectrometry
More informationOptical simulations within and beyond the paraxial limit
Optical simulations within and beyond the paraxial limit Daniel Brown, Charlotte Bond and Andreas Freise University of Birmingham 1 Simulating realistic optics We need to know how to accurately calculate
More informationLight. Electromagnetic wave with wave-like nature Refraction Interference Diffraction
Light Electromagnetic wave with wave-like nature Refraction Interference Diffraction Light Electromagnetic wave with wave-like nature Refraction Interference Diffraction Photons with particle-like nature
More informationarxiv: v1 [physics.ins-det] 6 Jun 2014
The design of a high flux VUV beamline for low energy photons Jiajia Wang 1, Mao Ye 2, Tan Shi 1, Rui Chang 2, and Shan Qiao 2 3 1. Physics Department, Laboratory of advanced Materials and Surface Physics
More informationPHYS 3410/3411/6750/6751: Modern Optics Midterm #2
Name: PHYS 3410/3411/6750/6751: Modern Optics Midterm #2 Wednesday 17 November 2010 Prof. Bolton Only pen or pencil are allowed. No calculators or additional materials. PHYS 3410/3411/6750/6751 Midterm
More informationMicroscopy. Marc McGuigan North Quincy High School Thursday, May 11, 2006
Microscopy Marc McGuigan North Quincy High School Thursday, May 11, 006 Outline Activity Introduction Electromagnetic Spectrum Visible Light Light Microscope AFM Scanning Electron Microscopy Near-Field
More informationComputational Lithography Turning Physics into Yield
Computational Lithography Turning Physics into Yield Tim Fühner Fraunhofer IISB Erlangen, Germany SEMICON Europa, TechArena, 11.10.2012 Lithography Modeling 2 SEMICON Europa, TechArena, 11.10.2012 Computational
More informationDr. Quantum. General Physics 2 Light as a Wave 1
Dr. Quantum General Physics 2 Light as a Wave 1 The Nature of Light When studying geometric optics, we used a ray model to describe the behavior of light. A wave model of light is necessary to describe
More informationdq dt I = Irradiance or Light Intensity is Flux Φ per area A (W/m 2 ) Φ =
Radiometry (From Intro to Optics, Pedrotti -4) Radiometry is measurement of Emag radiation (light) Consider a small spherical source Total energy radiating from the body over some time is Q total Radiant
More informationImaging Sphere Measurement of Luminous Intensity, View Angle, and Scatter Distribution Functions
Imaging Sphere Measurement of Luminous Intensity, View Angle, and Scatter Distribution Functions Hubert Kostal, Vice President of Sales and Marketing Radiant Imaging, Inc. 22908 NE Alder Crest Drive, Suite
More informationL 32 Light and Optics [3]
L 32 Light and Optics [3] Measurements of the speed of light The bending of light refraction Total internal reflection Dispersion Dispersion Rainbows Atmospheric scattering Blue sky red sunsets Light and
More informationDr. Larry J. Paxton Johns Hopkins University Applied Physics Laboratory Laurel, MD (301) (301) fax
Dr. Larry J. Paxton Johns Hopkins University Applied Physics Laboratory Laurel, MD 20723 (301) 953-6871 (301) 953-6670 fax Understand the instrument. Be able to convert measured counts/pixel on-orbit into
More informationLength, Germany, PTB (Physikalisch-Technische Bundesanstalt)
Laser radiations Laser radiations Laser radiations Laser radiations Length Length Frequency stabilized laser (He- Ne): vacuum wavelength Frequency stabilized laser (He- Ne): absolute frequency Frequency
More informationAP Physics Problems -- Waves and Light
AP Physics Problems -- Waves and Light 1. 1975-4 (Physical Optics) a. Light of a single wavelength is incident on a single slit of width w. (w is a few wavelengths.) Sketch a graph of the intensity as
More informationOptical twist measurement by scatterometry
DOI 6/opto3/o. Optical twist measurement by scatterometry A. Hertzsch, K. Kröger, M. Großmann INNOVENT Technology Development, Prüssingstr. 7B, 7745 Jena, Germany ah4@innovent-jena.de Abstract: To ensure
More informationModule 18: Diffraction-I Lecture 18: Diffraction-I
Module 18: iffraction-i Lecture 18: iffraction-i Our discussion of interference in the previous chapter considered the superposition of two waves. The discussion can be generalized to a situation where
More informationDevelopment of EUV wavefront metrology system (EWMS)
Development of EUV wavefront metrology system (EWMS) October 18, 2006 Katsuhiko Murakami, Katsumi Sugisaki, Masashi Okada, Katsura Ohtaki, Zhu Yucong, Zhiqian Liu, Jun Saito, Chidane Ouchi, Seima Kato,
More informationPhysics 202, Lecture 23
Physics 202, Lecture 23 Today s Topics Lights and Laws of Geometric Optics Nature of Light Reflection and Refraction Law of Reflection Law of Refraction Index of Reflection, Snell s Law Total Internal
More informationProgress of the Thomson Scattering Experiment on HSX
Progress of the Thomson Scattering Experiment on HSX K. Zhai, F.S.B. Anderson, D.T. Anderson HSX Plasma Laboratory, UW-Madison Bill Mason PSL, UW-Madison, The Thomson scattering system being constructed
More information6-1 LECTURE #6: OPTICAL PROPERTIES OF SOLIDS. Basic question: How do solids interact with light? The answers are linked to:
LECTURE #6: OPTICAL PROPERTIES OF SOLIDS Basic question: How do solids interact with light? The answers are linked to: Properties of light inside a solid Mechanisms behind light reflection, absorption
More informationTony Warwick Advanced Light Source Lawrence Berkeley National Laboratory
Synchrotron Beam Lines Stanford-Berkeley Summer School on Synchrotron Radiation June 13-17 th 2005 Tony Warwick Advanced Light Source Lawrence Berkeley National Laboratory ALS delivers (soft) x-rays 1.9
More informationX-rays are electro-magnetic radiation
X-rays are electro-magnetic radiation Just like visible light, X-rays are waves - cos[ 2π ( x / λ ft)] X-rays travel at the speed of light (c) Quantum Mechanics gives the energy of an X-ray photon c =
More informationSpectrographs. C. A. Griffith, Class Notes, PTYS 521, 2016 Not for distribution.
Spectrographs C A Griffith, Class Notes, PTYS 521, 2016 Not for distribution 1 Spectrographs and their characteristics A spectrograph is an instrument that disperses light into a frequency spectrum, which
More informationDiffraction. * = various kinds of interference effects. For example why beams of light spread out. Colors on CDs. Diffraction gratings.
Diffraction * Ken Intriligator s week 10 lecture, Dec.3, 2013 * = various kinds of interference effects. For example why beams of light spread out. Colors on CDs. Diffraction gratings. E.g. : Shadow edges
More informationTutorial Solutions. 10 Holographic Applications Holographic Zone-Plate
10 Holographic Applications 10.1 Holographic Zone-Plate Tutorial Solutions Show that if the intensity pattern for on on-axis holographic lens is recorded in lithographic film, then a one-plate results.
More information