ZEISS ForTune EUV Next Generation Wafer and Mask Tuning System

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1 Product Information Interactive PDF internet-link video/animation Version 1.0

2 High performance Wafer and Mask Tuning system for EUV technology Applications & has been designed and built to support the EUV industry. The tool gives significant contribution in both Wafer Fabs and Mask Shop environments. Key Applications Highlights Concept Registration Correction of EUV mask Wafer Intra-Field Overlay improvement Key ZEISS solution achieves Registration Improvement (mask level) > 70 % Low cost and short TAT per mask correction (30 K, < 1 day) Reduction of intra-field Mixed & Matched Overlay (MMO) to sub nanometer (wafer level) following mask writer improves Wafer Intra-field overlay by > 70 % 2

3 competences and flow for Mask Shop and Wafer Fab Applications & Enabler for extended scanner usability Shortens ramp-up phase and saves layer optimization repeats (APC) Reduce the need to rewrite a mask with Registration Errors i.e. can assure uninterrupted process flow Works with pellicle and compensates pellicle registration offset Highlights Concept ZEISS Registration and Intra-field MMO correction in mask shop or in Wafer Fab flow: Wafer Fab or Mask Shop Metrology Data FAVOR Tuning Module Post ForTune EUV Metrology Results *Transparent back side coating (TBC) on EUV masks is mandatory to allow process > 70% Improvement in registration accuracy 3

4 Technology Software Wafer Overlay/Mask registration Error control achieved by modifying ForTune Tuning Module (FTM) is the comprehensive the photomask with an ultra short pulse laser process inside the EUV mask software suite on the FAVOR system providing: LTEM (substrate modification). Applications & Each laser pulse introduces well controlled micro-strain elements (pixels) Accurate process simulation into the LTEM material, these deformation elements predictably alter and Process Analysis tools correct the registration and Intra Field Overlay. High computation power Highlights Concept ZEISS ForTune EUV process laser ForTune EUV Tuning Module A FAVOR Solution Semi transparent back side EUV bulk glass Multi layer stuck EUV scanner light No interference with micro-strain elements ZEISS FAVOR is the platform hosting the most advanced ZEISS applications. ForTune Tuning Module (FTM), AIMS Auto Analysis (AAA), Reference Image Generator (RIG) and Advanced Repair Center (ARC) are examples of ZEISS FAVOR solutions, guaranteeing high quality applications as well as intelligent automation. 4

5 ZEISS Semiconductor Mask Solutions Competence Centers and Distributors Applications & Highlights Concept ZEISS Competence Center Sales & Service Center International Spare Part Hubs About ZEISS ZEISS is an internationally leading technology enterprise operating in the optics and optoelectronics industries. ZEISS develops and distributes semiconductor manufacturing equipment, measuring technology, microscopes, medical technology, eyeglass lenses, camera and cine lenses, binoculars and planetarium technology. With its solutions, the company constantly advances the world of optics and helps shape technological progress. ZEISS is divided into the four segments Semiconductor Manufacturing Technology, Research & Quality Technology, Medical Technology and Vision Care/Consumer Optics. ZEISS is represented in over 40 countries with around 30 production sites, over 50 sales and service locations and about 25 research and development facilities. About Semiconductor Manufacturing Technology With a broad product portfolio and globally leading know-how in the areas of lithography and optical modules, the business group covers key processes in microchip production. Semiconductor Manufacturing Technology includes three business units: the Semiconductor Manufacturing Optics, the Process Control Solutions and Semiconductor Mask Solutions. It is headquartered in Oberkochen. During fiscal year 2015/16 this segment generated revenue of 972 million and employed around 2,700 people. For more information please visit us at 5

6 Exceeding the Boundaries of Lithography. // InNOVATION Made By Zeiss

7 Applications & Highlights Concept ZEISS facebook.com/zeisssmt Carl Zeiss SMT GmbH Strategic Business Unit SMS Carl-Zeiss-Promenade Jena Germany Tel Fax Carl Zeiss Co. Ltd. 22 Honshio-cho, Shinjuku-ku Tokyo Japan Tel Fax info@zeiss.co.jp Carl Zeiss SBE, LLC One Zeiss Drive Thornwood, NY USA Tel Fax Carl Zeiss Co. Ltd. 9F Kyoungdong Building Sunae-dong Gyeonggi-do Bundang-gu Seongnam-si South Korea Tel Fax info@zeiss.co.kr Learn more under ZEISS Customer Care Center 5F-1, No. 158, Section 2 Gongdao 5th Rd. Hsinchu City 300 Taiwan Tel Headquarters: Carl Zeiss SMT GmbH Rudolf-Eber-Strasse Oberkochen Germany Tel Fax Version FORTUNEB by Carl Zeiss SMT, Jena Due to a policy of continuous development, we reserve the right to change specifications without notice. Errors excepted.