Production dedicated HRXRD for LED / Epi-Layers Wafer Analysis

Transcription

1 QC-Velox QC-Velox HRXRD High Resolution X-Ray Diffractometer Production dedicated HRXRD for LED / Epi-Layers Wafer Analysis rev1.00

2 QC-Velox Overview Introduction Velox (Adj., Latin) - fleet, quick, rapid, swift, fast Jordan Valley s QC-Velox is the latest and most advanced HRXRD in the long running range of QC instruments. It is a dedicated quality control tool for high resolution X-ray diffraction for the compound semiconductor industry. It is suitable for the characterization of all common semiconductor substrates, including Si, GaAs, InP, GaN and others. Measurements can be run partially or fully automated, with user-customizable scripts handling the routine work. QC-Velox meets the needs of mass-production LED and Epi-Layer wafer manufacturers by Closing the Metrology Loop QC-Velox measurements are analyzed by JV RADS Analytical software, the market-leading HRXRD data simulation, analysis and fit (patented). This offers our customers a comprehensive and unique process control solution, with fast and accurate calculation of process parameters and immediate feedback to production. This results in yields & profitability enhancements. QC-Velox Features and Benefits High Productivity through Highest Intensity available Edge-to-Edge FULL Measurement (No Edge Exclusion) High Productivity through advanced Sample-Plate design Enhanced Dynamic Range Detector Stage: allows highest dynamic range detection of any HRXRD systems Integrated Bar Code Reader: enables error-free wafer identification and fast registration of sample IDs Simple to use Recipe creation and running The Jordan Valley complete process control solution enables our customers to close the metrology loop in the fastest and most accurate way.

3 QC-Velox Features and Benefits QC-Velox Features and Benefits VeloMAX Optics: High productivity through >10x intensity improvement The incident beam of the QC-Velox system includes a number of standard features to obtain high intensity these are not paid extras. The crystal choice is optimised by material: Increased throughput and improved repeatability with no loss of resolution. Allows faster measurements with higher precision than possible before without reducing the resolution. This is key to maintaining an accurate composition value in the MQW analysis. Multilayer mirror as standard on all QC-Velox systems For high mosaic samples a conditioning crystal divergence of 25 is used to enhance the intensity of the system (fitted as standard) For traditional III-V systems, a higher resolution conditioning crystal (<10 ) can be provided instead of the 25 crystal (needs to be indicated on the PO) The alignment of the system is performed easily and safely without open beams being present in the cabinet. VeloSWAP : High productivity through advanced sample plate design Kinematic Sample Plate: enables fast swap sample plates each plate can be removed / replaced in seconds. Thanks to the kinematic loading, no alignment of the plate is needed after fitting. Multiple plates can be supplied and used interchangeably. Kinematic Sample-Plate Swap: Twist and Lift 31 x 2 kinematic sample plate for large batch measurements to increase the time between plate reloads and enhance productivity and tool efficiency. External barcode reader can be mounted to the tool or a stand-alone station

4 QC-Velox Features and Benefits VeloSCAN : Fast, high dynamic range scanning of mosaic layers with HRXRD The scanning detection system includes a number of features as standard to enhance the capability of the system EDRc (Enhanced Dynamic Range) detector has a dynamic range of > 5x10 7, extending beyond 5x10 8 with fully automated attenuator Auto-aligning triple axis crystal is essential to obtain required resolution for GaN measurements. Motorized detector slit allows control on system resolution without changing modules by hand Ultra-fast software scanning engine to allow full range scans in as little as 5 seconds. Integrated Bar Code Reader: enables error-free wafer identification and fast registration of sample IDs: Simply use the bar code reader to input sample and recipe information into the software. Maximizing Productivity: Sample plates can be loaded and registered whilst a batch is being measured: For maximum productivity and flexibility, we recommend using 2 sample plates. Whilst one plate is being measured in the tool, load the second plate with wafers and pre-register all of the sample information and the required recipes. When ready to measure, simply remove the first plate from the tool, install the second plate and load the sample plate information. Then click run. Edge-to-Edge FULL Measurement (No Edge Exclusion) QC-Velox supports FULL Wafer Measurement, with no edge exclusion.

5 QC-Velox Features and Benefits Sample Plate Options Fully customizable VeloSWAP sample plates to meet customers wafer size production requirements. A wide range of sample plates have already been designed for our existing customers. Below are a sample of commonly requested plates: 31x2 20x2 3x4 & 8x2 5x4 2 to 200mm Should you require anything different to these plates then please consult your local Jordan Valley representative. The QC-Velox system can accommodate most designs of sample plate for combinations of wafer sizes. Robot Option Fully automated wafer loading and measurements for all wafer sizes up to 200mm A n optional robot is available for the QC-Velox, which allows fully automated measurements from cassettes of wafer Automation (robot) support: Allows for robot loading of 2 to 200mm wafers, with the associated software Designed to comply with SEMI S2 and S8 standards Any combination of recipes for any number of slots Increased wafer cleanliness by removing manual handling of wafers Automatic software detection of wafer cassette sizes Increased productivity for larger wafer sizes Cleanliness support (optional): This option is designed for high level clean-rooms, and includes a minienvironment and special sample plates Designed to comply with SEMI standards

6 QC-Velox Features and Benefits Recipes Recipes contain all of the information to automatically align, measure and analyze the samples on the stage. No manual alignment is required: all of the work is done automatically by the tool recipes. Recipe Creation Flexible, easy to use tools to create recipes Recipe creation is typically performed by a tool owner / engineer using the built-in recipe creation wizards. Covers all common measurements performed on the system Creation time typically < 1 minute using a graphical wizard D e f a u l t p a ram e t e rs c a n b e customized on installation to suit the customer. Recipes can include multiple measurements on multiple wafer sites All recipes allow automated analysis and reporting into the log file. Recipe Running Batch execution: as easy as 1,2,3! Running recipes is extremely simple and can be performed by an operator with minimal training: Click recipe Click assign to wafers Click start

7 QC-Velox Features and Benefits Custom Reporting Reports automatically created for fast information and notification Reports allow a summary report to be saved recording all of the key parameters measured for that particular wafers, along with statistical analysis across the wafer. Parameters include thickness and composition for all layers, MQW period and peak separations, individual peak information (width, separation, intensity, position), wafer bow and curvature amongst others. Customized reports can be created for each wafer, batch and chamber. Individual reports are automatically saved locally and can be copied to a network or host computer. Glancing Incidence XRD Option An optional module can be purchased with the system to allow the measurement of glancing incidence X-ray diffraction. This is the measurement of the lattice spacing parallel to the surface of the wafer. These give information on the in-plane twist of the GaN, and are useful for development and trouble-shooting of the GaN systems rather than production measurements. Multiple 2 wafers or single 4 / 6 wafers. Auto-sensing when the module is in place (100) and (110) reflections of GaN can be accessed, Recipes set for measurements on multiple wafers. All alignment, measurement and analysis is fully automated as for all other measurement types.

8 QC-Velox Applications HRXRD and Relaxation Materials: Single crystal substrate (e.g. Si, GaAs, InP, GaN) and epilayers, including multi-layer structures Parameters: layer thickness, composition and relaxation, strain, area uniformity, mismatch, dopant level, miscut, layer tilt. Detector stage with slits & Triple axis Analyzer crystal Detector Sealed tube X-ray source with mirror and crystal Slits Sample stage with multiple wafers Direct measurement of relaxation / strain / composition of layers within a multilayer structure Automated sample alignment, measurement, analysis and reporting Analysis performed by the JV-RADS software. Symmetric, asymmetric and skew symmetric reflections possible for c o m p o u n d s e m i c o n d u c t o r substrates Omega-2Theta scan of SiGe epi-layer.* * Sample courtesy Hitachi-Kokusai Electric

9 QC-Velox Applications Triple Axis & Reciprocal Space Maps Materials: Single crystal substrate (e.g. Si, GaAs, InP, GaN) and epilayers, including multi-layer structures Parameters: layer thickness, composition and relaxation, strain, area uniformity, mismatch, dopant level, miscut, layer tilt. Detector stage with slits & Triple axis Analyzer crystal Detector Sealed tube X-ray source with mirror and crystal Slits Sample stage with multiple wafers Direct measurement of relaxation / strain / composition of layers within a multilayer structure Automated insertion of triple axis analyzer crystal into the beam Automated sample alignment, measurement, analysis and reporting Reciprocal space maps performed in minutes and created using Contour software Triple axis diffraction scans can be simulated using JV-RADS analysis software Reciprocal space map of GaN multiq u a n t u m w e l l, s h o w i n g c l e a r satellite peaks. These highlight the well c on t rolled growth of the multilayer structure. RSMs can be collected in only a few minutes to allow f o r f a s t f a u l t diagnosis during production.

10 Intensity (cps) I n t e n s i t y ( c p s ) QC-Velox Applications Use of a Triple Axis G a N Analyzer , D 1, a n a l y s e r c ry s t a lcrystal * A ix G a N 1 a a 1.x 0 1 * A IX G A N 2.X 0 4 scan -2 scan w F W H M " w - 2 T h F W H M " A x is _ 2 ( s e c ) B e d e S c ie n tific In s tr u m e n ts L td. d d d d d 1 d 2 d 3 Fix 2, scan : measure tilt mosaic Scan : measure strain Experimental data, collected with triple axis analyzer crystal. Fixing the detector allows the mosaic tilt to be investigated, whereas scanning the sample and detector together probes changes in lattice parameter (due to strain). AlGaN Layers on GaN Reference [Comparison 1] Comparison 2 Comparison Expt Data Fit E x p e r imental d a t a (black), collected with triple axis analyzer crystal, and RADS simulation (red) of AlGaN layer on GaN Omega (sec) RADS simulation gives individual layer thickness and composition of simple and more complex structures.

11 Intensity (arb. units) Intensity (cps) QC-Velox Applications GaN-based MQW Omega-2Theta Expt Data Fit Data 102 Omega Expt Data Fit Fit* Omega-2Theta GOF: MAE (log10) is 0.156, Angle from to OMEGA_REL (arcsec) Standard QC methods for GaN-based materials are generally a combination of two major scans: an Omega scan on the 102 reflection to give the GaN buffer quality, and an Omega-2Theta scan on the 002 reflection to give information about the epilayers, typically the MQW period and composition of InGaN and AlGaN. These measurements can be performed on the QC-VELOX within the same recipe, including all sample alignment, measurement and analysis, and a simple report of the results automatically displayed. GaAs-based HEMT Expt Data Fit The QC-VELOX system is the ideal choice for the characterization of c o m p o u n d s e m i c o n d u c t o r materials, including InP and GaAs based materials. In this example, the individual thickness and composition of all layers within the GaAs HEMT can be determined from first principles using Jordan Valley RADS software, even with more complex buffers present.

12 QC-Velox Specifications Item X-ray Tube / Generator X-ray beam Resolution Multilayer Mirror Omega Range Resolution 2Theta Range Resolution X / Y Range Resolution Z Range Resolution Phi Range Resolution Chi Range Resolution Specification 2.2kW Cu LFF tube <10, Kα1 (Ge004) <30, Kα1 (Ge220) As standard 14 to 38, ~1 29 to 107, ~2 >300mm on both, 0.010mm 10mm 0.010mm Unlimited to Software RADS The original and still the best dynamical HRXRD simulation and fitting software. Allows simulation of symmetric and asymmetric spectra. RADS uses a patented genetic algorithm to ensure robust and precise data analysis with results you can trust. PeakSplit General HRXRD calculation software. It can be used either to analyze data or predict where peaks are likely to occur to efficiently plan data scans Contour Mapping software, for area maps, reciprocal space maps and texture maps (including ODF) Control and Acquisition Control and acquisition software to control the instrument. Standard measurements can be easily defined, and custom routines implemented for all applications and materials. Provides an interface for either robot loading or multiple wafers per sample plate. Detector Dynamic Range ~5 x 10 7 Triple Axis Crystal Wafer sizes (manual) As standard Small pieces to 300mm, multiple smaller wafers on single plate Custom wafer plates available on request Robot wafer sizes Footprint 2 200mm, other sizes available on request ~1m x 1m (no robot) Jordan Valley Specifications and offers are subject to change without notice or obligations. All sales are subjected to our terms and conditions, a copy of which is available on request. Jordan Valley is a registered trade mark of Jordan Valley Semiconductors Ltd Global HQ Industrial Zone #6 POB 103, Ramat Gavriel Migdal Ha Emek Israel T: F: E: ask@jordanvalley.com UK Office Belmont Business Park Belmont Durham. DH1 1TW UK T: F: E: enquiries@jvsemi.co.uk USA Office 3913 Todd Lane Suite 106 Austin, TX USA T: +1 (866) E: sales@jvsemi.com