Design Guide MLA150. Maskless Aligner

Transcription

1 Design Guide MLA150 Maskless Aligner

2 Doc. No.: DWL-HI-064 Revision: 0(Oct 2015) Copyright 2015 by Heidelberg Instruments

3 Table of Contents Table of Contents Table of Contents... i List of Figures... ii 1 Introduction... 1 About this Guide... 1 Related Documentation... 1 Contact General Design Rules... 3 Orientation... 3 General Design Rules Specific Design Rules... 7 GDSII... 7 DXF... 7 CIF... 8 Gerber... 9 HIMT Structure Format Design Creation Setting up Designs with LayoutEditor Setting up a CIF Design Creating HIMT Structure Format Notes User Guide i

4 1 List of Figures Figure 1: Machine-related design rotation (MLA150)... 3 Figure 2: Layer Merging... 4 Figure 3: Polygon/Polyline drawing rules... 6 Figure 4: Sample CIF Design Figure 5: Exposed CIF design ii User Guide

5 1 Introduction The following content is a brief introduction into the content and purpose of this document. About this Guide This Design Guide is a document related to the User Guide and the Conversion Software Guide for your system. In this manual you find data information on how to build up a design that is to be exposed on the lithography system. General as well as specific design rules are briefly listed which facilitates design creation. For any requests please contact Heidelberg Instruments (see 1.3 Contact). Related Documentation Heidelberg Instruments offers several further manuals related to the machine and its operation. If you did not get one of these or if you need an update, please contact Heidelberg Instruments, Germany. See the list of related documents below: Pre-Installation Guide Safety Guide Conversion Software Manual User Guide Quick Guide Maintenance Guide Technical Data Sheet User Guide 1

6 1Introduction Contact Should you need assistance, please contact your local service office: China: Heidelberg Instruments Service China Rm.101, Block 1, Animation Park, Yuehai Street, Nanhai Road, Nanshan Distr., Shenzhen China Phone: / -2 / -7 Fax: service_china@himt.de Europe: Heidelberg Instruments GmbH Service Department Tullastraße Heidelberg Germany Phone: Fax: service_europa@himt.de Japan: Heidelberg Instruments Service Japan Germany Center for Industry & Trade , Hakusan Midori-ku, Yokohama, Japan Phone: Fax: service_japan@himt.de Korea: Heidelberg Instruments Service Korea #316 Expo Officetel, 381 Mannyeon-dong, Seo-gu Deajeon, South Korea Phone: Fax: service_korea@himt.de Taiwan: Heidelberg Instruments Service Taiwan 6F-5, No. 192 DongGuang Road Hsinchu City, Taiwan Phone Fax service_taiwan@himt.de USA: Heidelberg Instruments Inc. USA 2807 Oregon Court, Unit E2 Torrance, CA, USA Phone: Fax: service_usa@himt.de You can also reach Heidelberg Instruments via himt@himt.de, or visit our site on the internet: 2 User Guide

7 2 General Design Rules This chapter deals with the rules that have to be considered for design creation. These rules apply for every kind of format and have to be followed to get correct exposure results. Orientation During your preparation work for the exposure procedure keep in mind that data view and stage view differ from each other. The following figures give an explanation of the difference between data view and stage view depending on the system type. The design is exposed rotated by 90 degrees in clockwise direction. The coordinate system of the stage is oriented such that the x-axis corresponds to a backward-forward movement, while the y-axis corresponds to a left-right movement when standing in front of the machine. 90 clockwise A Y X loading side Figure 1: Machine-related design rotation (MLA150) User Guide 3

8 2General Design Rules General Design Rules AREAS: Use only polygons/closed polylines and circles to define exposure areas. Lines cannot be used to define an area; only the outlines will be exposed. COMBINATION OF STRUCTURES: Some of the design formats that can be converted to LIC are layer based (DXF, GDSII). Also, structures can overlap within a design. In both cases, the treatment of overlapping structures has to be defined, sometimes by the user, sometimes by the software. The following logical commands are available: OR: Results in a true merging of the structures. Any structures that lie completely within bigger structures are covered by these. CUT: Subtracts a layer from the previous layer XOR: Leads to a cutting only in the overlap region, while elsewhere both structures remain intact. So OR and XOR are applied for overlapping structures within a layer / design. OR and CUT are used for merging of HIMT structure files. Figure 2: Layer Merging 4 User Guide

9 2 General Design Rules In designs with multiple layers, different operations can be chosen for each layer combination. Operations are executed layer-by-layer from the top of the list to the bottom. There is no way of enclosing sets of operations in brackets, not even by merging of merged files (see merging of HIMT structure files). Note: If several layers are merged, the result of each CUT operation depends on the order of operations. LINES: Lines have to be defined with a fixed positive line width. Lines with width zero are ignored, as well as any line width changes within a line (tapered lines). POLYGONS/POLYLINES: Polylines must be closed (last point has the same coordinates as first point) Areas surrounded by a polyline are filled. Therefore, if polylines are not closed, the complete design area is filled. Some data formats allow automatic closing of polylines. Always use this option if available, or make manually sure all polylines are closed. Do not cross polylines Crossed polylines create ambiguities that can lead to data errors. Do not create double vertices Double vertices are successive points with identical coordinates. These lead to data errors. User Guide 5

10 2General Design Rules P2: 10,7 P3: 10,7 P4: 22,5 P2: 10,7 P3: 22,5 P1: 0,0 P5: 26,1 P1: 0,0 P4: 26,1 Figure 3: Polygon/Polyline drawing rules NAMING: Do not use special characters (punctuation marks, umlauts etc.) or spaces in the design name. Do not use main as name for a layer, cell or any structure. TEXT: Text is only supported for DXF format. GENERAL SIZE LIMITS: 1,000,000 vertices/polygon (vertex = defined point) maximum definition or reference depth: 16 maximum number of definitions or references: 100,000 Note: There might be limits below these for specific formats! 6 User Guide

11 3 Specific Design Rules This chapter gives an overview of the additional format-related design rules. GDSII GDSII is a very common design format for layouts of integrated circuit boards. Numerous programs use it as standard output format, or offer it as export option. Rules for this format apart from the general rules above are few: No Inclusions: Do not include other GDSII files or text libraries, they will be ignored. No nodes: Node statements in GDSII are ignored. Also see the information on available design format options in the related document Conversion Job Manager. DXF DXF is a common graphics design format, used by the well-known AutoCAD software. There is also other design software available that can export into DXF format, and software that can translate between different design formats (e.g., LinkCAD). Regardless of the design software you use, make sure the resulting file format is 100% AutoCAD R12 compatible. Create designs according to the software manufacturer s instructions, taking into account the general plus the following additional rules. UNITS: Use the metric system when designing (mm as basic unit recommended). STRUCTURES: Apart from the above listed structure types, for DXF, also text is supported. Any other advanced structure types are not supported. It is recommended to only use circles, polylines and text. Avoid placing structures in layer 0. TEXT FORMATTING: Only one text font is provided (Courier-like typewriter font). This will replace any other font used in the design creation. The only supported text attributes are: rotated mirrored User Guide 7

12 3 Specific Design Rules scaled BLOCKS: When inserting blocks, the same scaling has to be used for x and y. External blocks are not supported LINES: Polylines with width must not change their linewidth (tapered lines not allowed). Linewidth changes within a line will be at best ignored, at worst they can cause conversion errors. Single lines without width are ignored. POLYGONS: Polygons have to be defined as closed. Open polygons will be ignored. DXF TRANSLATOR TOOL Although our dxf translator supports newer dxf releases, we recommend to use Release 12. CIF The Caltech Intermediate Format (CIF) is a design format for direct creation of designs in a text editor. For complex structures, it is recommendable to use a professional CAD software that can create e.g., AutoCAD R12 compatible DXF design files. If only small test structures are set up, they can be easily defined and varied in a CIF design file. There are a few rules that have to be taken into account in addition to the general rules when setting up a CIF design: CIF SPECIFIC ADDITIONAL DESIGN RULES Maximum definition or reference depth is 50, meaning that not more than 50 subroutine calls may be nested into each other. For instructions on how to set up a design refer to 3.1 Setting up a CIF Design. 8 User Guide

13 3 Specific Design Rules Gerber The Gerber format is used for vector mode exposures. A vector mode exposure is recommendable for designs with only a few line structures, where a scanning of the full area would take longer than a direct writing of the structures. Also, it improves the edge quality of lines written under an angle, but exposure time increase significantly. In Gerber format, structures are described via apertures and a path across the design field. The opening and closing of the aperture along the path, and the selection of aperture types, create the final structure. Note: Keep in mind that the effective line width also depends on system parameters and processing. RS-274D only: Always provide a complete set of information including at least the following: apertures used, digits of design data, and base unit (inch or mm). Do not use incremental, but rather absolute coordinates. Avoid using circular interpolation along with polylines and width. Avoid using apertures without dimensions, e.g., circle with a zero diameter. Flashmode (D3) remains until another drawing mode is chosen (sometimes called modally). To create area-filled polygons, use the polygon aperture (RS274) or G36/G37 commands (RS274-X, RS274). User Guide 9

14 3 Specific Design Rules HIMT Structure Format The HIMT structure format is an intermediate format (for 2D designs). All design formats are converted into this format during the conversion process before the breaking down into machine units and the translation into the LIC format take place. It is possible to directly store designs in this format. These designs can be created in an usual design editor. When typing in the following command, a triangle is created: P [l] 5399 See 4 Design Creation for more information. 10 User Guide

15 4 Design Creation This chapter informs about how to create a design. You find examples and explanations on the specific creation commands for the design types CIF, Gerber and the HIMT format. When creating a design, keep in mind the general design rules (1 General Design Rules) and the specific ones for each design type (2 Design Types). Setting up Designs with LayoutEditor LayoutEditor is the most popular software for design editing in the field of microfabrication. It is a versatile tool offering a variety of sophisticated functions such as design rule checkers and macros. A three-button mouse, preferably with clickable scroll wheel, is strongly recommended. Every design format can be created, loaded and converted into other design formats. Before using LayoutEditor read the user guide which is enclosed to the machine documentation. For starting this useful tool, double-click the icon at the desktop. Some of the most widely used functions are explained in the following: Functions LayoutEditor provides various useful functions. However, the following information consists only of the functions that are essential for actions related to using the file format conversion macro. Context menus are available for most parts of the user interface by a right mouse click. For looking up other functions and instructions, refer to the software producers documentation (go to HelpHelp). Scrolling: Two ways of scrolling Using the arrow keys. There are two ways of scrolling with the arrow keys. First you can move the viewer window over the drawing or you move the drawing inside the viewer window. To choose between these options, go to UtilitiesSetupUser InterfaceGeneral and activate or deactivate Swap Scroll Direction. Holding down the right mouse button while moving the mouse. Zooming: There are also two possibilities to handle the zooming function: Using the scroll wheel to zoom in and out. Using the items of the Zoom menu: User Guide 11

16 4 Design Creation Measure: o ZoomZoom Mouse is for zooming in and out in an area selectable by the mouse. To select the area, click and drag to define a box for the new zoom. o ZoomZoom Fit All sets the scale to an optimal value to show the complete cell. o ZoomZoom Fit Selection sets the view to include all of the items that are selected. Note that as you change the zoom, the grid points in the drawing window change. This is the Automatic Grid command and Auto is the default setting. The spacing between grid points is shown in the Status bar. To change the grid spacing manually, right-click into the field and choose from the menu items. Alternatively, left-click into the field and enter the desired values. LayoutEditor offers a measurement function accessible via the menu bar. Go to UtilitiesMeasurement Tools and select the appropriate tool for your current application. For measuring a distance between two points, select Ruler [Ctrl+1]. With Angle [Ctrl+3], you can measure an angle between two points (for further details and measurement functions got to HelpHelp.) Setting up a CIF Design CIF designs are composed of several routines and subroutines. The lowest subroutines contain the geometrical shapes to be used. These subroutines can then be combined and multiplied in higher routines. The higher routines then call these initial subroutines and combine them with position information. Several routines may call the same subroutines. Subroutines may be called several times in the same routine. Subroutine calls may be combined with definitions of geometrical structures in the same routine. Structure This is an example for the structure of a CIF file: <Routine 1000> <Call of Subroutine 100> <Call of Subroutine 200 in Position X1,Y1> <Call of Subroutine 200 in Position X2,Y2 with mirroring on y axis> <Subroutine 100> <Call of Subroutine 10 in Position X4,Y4> <Call of Subroutine 10 in Position X5,Y5 with rotation> 12 User Guide

17 <Description of geometrical structure at X6, Y6> <Subroutine 200> <Description of geometrical structure at X7,Y7> <Description of geometrical structure at X8,Y8> <Subroutine 10> E; <Description of geometrical structure at X9,Y9> MLA150 4 Design Creation Here, the system identifies 1000 as the main routine, as it is the routine with the highest name definition. The final E denotes the end of the file. Routines and subroutines consist of statements. Each of these statements can be combined with parameters, and is closed with a semicolon. Start and end of a routine is denoted by the statements Definition Start (DS) and Definition Finish (DF). With the start of a definition, the scaling has to be defined. The basic unit of the CIF format is centimicrons (10nm). As only integers are allowed, a scaling factor has to be used to define structures in smaller increments than this unit. At the same time, for large structures, the scaling can be used to avoid large numbers. To reach both aims, a multiplier and a divider have to be introduced, by which the basic scaling unit of 10nm is modified. The general subroutine structure looks like this: DS <definition name> <scale divider> <scale multiplier>; <statements>; DF; In the example: DS ; <statements>; DF; all coordinates and sizes within routine 10 have the unit 100nm instead of 10nm, allowing to drop one zero from all numbers. Anywhere within a CIF design file comment lines may be added by putting the text within brackets: (this is a comment); Statements User Guide 13

18 4 Design Creation All statements have necessary parameters and optional parameters. In the description of available statements necessary parameters are listed between curly brackets { }, optional parameters between square brackets [ ]. The statement that interlinks routines is the CALL (or just C) statement: C {routine identification number} [T XT YT] [R XR YR] [MX] [MY]; T: If no options are used, the structures of the subroutine will be arranged around the origin of the routine from which the call is made. Alternatively, the subroutine structures can be shifted with the T ranslation option combined with a set of offest coordinates XT YT (written with just a space in between). R: With the R otation option, the structure set of a subroutine can be rotated. The coordinates define a vector with origin at 0,0. The x axis of the routine will be rotated until it is parallel to this vector and points in the same direction. A rotation R 0-1 is therefore a clockwise rotation by 90, while R 2 1 will lead to a ccw rotation of 30. The coordinate set 1,0 is without effect (vector along x axis). Note: The turning point for rotation is not the origin of the subroutine, but that of the routine in which the call is issued! MX / MY : These are options for mirroring at the x- or y-axis. The mirroring is done with respect to the coordinate system of the calling routine, not the internal axis of the called subroutine. In subroutines containing geometrical statements, a definition is usually required to which layer these structures belong. This is defined with the LAYER (L) statement.. L {layer name}; Layer names are generic usually denoting technology and layer e.g., CM for CMOS Metal. The geometrical statements available for design structure definition are: BOX (B), WIRE (W), ROUNDFLASH (R) POLYGON (P) B {XSize YSize XPos YPos} [XRot YRot] defines a filled square. XSize / YSize: Defines the box size (width in X, height in Y) XPos / YPos: Defines the position of the box center within the current routine XRot / YRot: The mechanism of defining a rotation for the box is the same as in the CALL command: A vector with origin at 0,0 is defined by the coordinates of the end point, and the structure will be rotated around 0,0 until the x axis is parallel to the vector, and points in the same direction. 14 User Guide

19 W {Width X1 Y1 X2 Y2} [X3 Y3 ] defines a polyline of fixed width. MLA150 4 Design Creation Width: Defines the width of the line. Lines with width 0 are ignored. To make sure that lines are really drawn they should be larger than the spot size specifies for the write mode to be used (see specifications in Appendix A). X# Y#: Coordinate sets defining the path drawn. Lines between coordinates are always straight. R {Diameter XPos YPos} defines a filled circle. Diameter: Sets the circle diameter. XPos YPos: Defines the position of the circle center. P {X1 Y1 X2 Y2 X3 Y3} [X4 Y4 ] defines a filled polygon. X# Y#: At least three coordinate sets are required to define a polygon. The polygon will be closed automatically. User Guide 15

20 4 Design Creation Example Example for a CIF design: (A CIF sample smiley file); DS ; L CM; (eye circle); R 4 0 0; DF; DS ; C 10 T -1 0; DF; Figure 4: Sample CIF Design DS ; L CM; (nose box); B ; DF; DS ; L CM; (mouth triangle); P ; DF; DS 400; L CM; (wire frame positive quadrant); W ; 16 User Guide

21 4 Design Creation DF; DS ; (putting together the parts); C 100 T 0 1; C 100 T 0 1 MX; C 200; C 200 R 0-1; C 300 T 0-1; C 400; C 400 R 0-1; C 400 MX; C 400 R 0-1 MX; DF; Figure 5: Exposed CIF design E; User Guide 17

22 4 Design Creation Creating HIMT Structure Format Structure files consist of a number of ASCII text lines with each line containing one command. Commands begin with a letter specifying the command, which is followed by the necessary numerical parameters. Numerical parameters may have a maximum size of +/- 2.14*10E9 (32 bit signed INT) and the units are always in nanometers (nm). Call command: C NAME [1 TX TY] [2 R1 R2] [3 M1 M2] [4 S1 S2] The brackets [ ] indicate optional parameters Call command includes the Structure file NAME in the further conversion and all included files must be located in the same directory. Valid parameters: 1. TX TY: TX and TY define translation of the called Structure file towards the origin(0,0) in nm. 2. R1 R2: Defines a rotation of 90, 180 or 270 degrees counterclockwise for the called file. Valid combinations for R1 and R2: R1 R2 rotation M1 M2: Mirrors design to the x- or y-axis: M1 M2 mirror to 0 1 x-axis 1 0 y-axis Example: C LAYER S1 S2: Scales the called file. The ratio S1/S2 represents the magnification factor. For maximum precision S1 and S2 must consist of large integers. 18 User Guide

23 4 Design Creation Example calling the Structure file LAYER2 with a magnification factor of 4: C LAYER Polygon command: P X0 Y0 X1 Y1 X2 Y2... X0 Y0 Xi and Yi are the corresponding coordinates for each point of the polygon; where up to points in one polygon may be used for the area within the polygon to be exposed. Note: The last coordinate pair must be identical to the first. The following example using the polygon command would draw a rectangle with the "center" at (0,0) and the size of 1000nm x 2000nm: P Circle command: X R XC YC R represents radius, XC and YC are the center coordinates. The circle command will draw a filled circle at (XC, YC) with the radius R. The following example using the circle command would draw a circle of 2500nm radius at the coordinates (10000,20000): X Angles, Step&Repeat and Scaling Any Angle 2 %d %d (int) (cos(rad (rot_angle)) * BIG_INT_ROT) (int) (sin(rad (rot_angle)) * BIG_INT_ROT)) RAD -> deg/180.0*pi BIG_INT_ROT -> Step&Repeat C <name> 5 <step nr in x> <step nr in y> 6 <step size in x [nm]> <step size in y [nm]> Scaling C <name> 7 <val_a> <val_ B> 4 <div_ A> <div_ A> Scale independent in "x" and "y". User Guide 19

24 4 Design Creation Scale X = val_ A / div_ A Scale Y = val_ B / div_a Rule: val_ A, val_b and div_a must be integer numbers 20 User Guide

25 Notes User Guide 21