Ultrafast laser micro/nano processing research at the NCLA under the Inspire nanoscience platform

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Melvyn Cummings
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1 Ultrafast laser micro/nano processing research at the NCLA under the Inspire nanoscience platform Alan Conneely Centre Manager National Centre for Laser Applications NUI Galway, Ireland 22 nd September 2009 AILU Micro-Nano Workshop Slide 1

2 Summary Background to the NCLA Overview of the Inspire platform Highlights of the Inspire platform New Ultrafast laser facility at NCLA Conclusion Slide 2

3 NCLA Mission Statement To create a technology centre of excellence in the field of laser materials processing that conducts internationally recognised research, commercialises proprietary research activity, and promotes technology transfer to industry Slide 3

research Applied research Technology transfer and promotion Primary Industry sectors Medical device Electronics & semiconductor Precision

4 Background NCLA established in 1989 (20 th Anniversary!) Aim to promote the use of laser materials processing technology in Irish industry Core activity in laser materials processing Fundamental research Applied research Technology transfer and promotion Primary Industry sectors Medical device Electronics & semiconductor Precision engineering Scale of operations Annual turnover > 1 million 11 research staff, 6 graduate students, tech support, administrator Interacts with ~ 50 client companies per annum Largest installed base of machining lasers for R&D in Ireland (~10) Slide 4

Proprietary Technologies & Commercialisation Laser

5 NCLA Activities & Research Flow Industry Direct Outreach & Networking Laser Technology Transfer Industry Direct Proprietary Technologies & Commercialisation Laser Technology Development Fundamental Research Basic Laser Research Slide 5

simulations Axis of symmetry Primary shock wave Secondary shock wave x A Computational domain for DSMC modelling B H Micromachining Surface

6 Research Agenda Fundamentals of laser-material-ambient interactions - Ultrafast > nanosecond laser ablation regime - Shock wave interactions with ambient/material Laser pulse Computational modelling of laser material interaction - Molecular dynamics simulations - Continuum simulations Axis of symmetry Primary shock wave Secondary shock wave x A Computational domain for DSMC modelling B H Micromachining Surface engineering & modification Advanced laser beam conditioning & delivery Nanotechnology related laser technologies H 1 O E Silicon wafer L C D y Slide 6

7 Overview of Inspire Platform INSPIRE (Intregrated Nanoscience Platform for Ireland) brings together all leading nanoscience researchers on an all-island basis to enable the establishment of: 1. Shared nanoscience infrastructure 2. Development of enhanced research collaboration 3. Implementation of a national graduate school programme NCLA is a member of INSPIRE under LightHOUSE Centre for Applied Photonics (NCLA + Applied Optics Group) Slide 7

8 Inspire Consortium Slide 8

9 Summary of new Infrastructure High Resolution TEM Focussed Ion Beam (FIB) processing system Ultrafast Laser Plasma Generation and Analysis Femtosecond & Picosecond laser nanostructuring High-Speed Plasma Imaging (Streak and CCD Cameras) Confocal Raman Spectroscopy for Laser Ablation Atomic Force Microscopy with Raman Spectroscopy Field Emission SEM High Resolution X-Ray Diffractometer Pulsed Laser Deposition system Dynamic Light Scattering Particle Sizer Laser Lithography & Nanoprinting Clean Room Facilities Dedicated Fabrication Training Facilities Dedicated Photonics Training Laboratory Slide 9

10 Open Access through website: Slide 10

11 Example: Focussed Ion Beam Carl Zeiss Cross Beam 1540 dual beam FIB focused ion beam and electron beam microscopy tool Located in CRANN, TCD Slide 11

12 Example: HR Resolution Electron Microscopy NOVA HR SEM Located in Tyndall Slide 12

13 Example: Transmission Electron Microscopy JEOL JEM2100f Located in MSSI, UL Slide 13

14 Example: Femtosecond Laser in CRANN Research: interactions between laser and materials, principally in nanoscale materials such as quantum dots Slide 14

Example: Femtosecond laser in DCU Coherent System at NCPST in DCU Micra-5 Ti:Sapphire Oscillator Avg Modelocked Power >300mW at 800nm Bandwidth (nm) <30 to >100 Tuning Range 750-860nm Repetition Rate

15 Example: Femtosecond laser in DCU Coherent System at NCPST in DCU Micra-5 Ti:Sapphire Oscillator Avg Modelocked Power >300mW at 800nm Bandwidth (nm) <30 to >100 Tuning Range nm Repetition Rate 76-82MHz Legend Elite (USP-HE) Ti:Sapphire Amplifier Repetition rate (khz) 1 or 5 Pulse Duration (fs) <35fs Pulse Energy (mj) >3.5 at 1kHz >0.7 at 5kHz Research: The femtosecond laser along with a C5680 series Hamamatsu streak camera are used for the advanced characterisation of ultra-fast processes for photonic systems Slide 15

16 New Ultrafast Facility at NCLA Slide 16

Picosecond laser: Trumpf Trumicro 5050 Technical Specifications Trumpf Trumicro 5050 Wavelength: 1030 nm Pulse Duration: <10 ps Pulse Energy: 125 µj Average Power: 50 W Pulse Repetition Rate: Single

17 Picosecond laser: Trumpf Trumicro 5050 Technical Specifications Trumpf Trumicro 5050 Wavelength: 1030 nm Pulse Duration: <10 ps Pulse Energy: 125 µj Average Power: 50 W Pulse Repetition Rate: Single shot to 400 khz M 2 <1.3 Second Harmonic Generation 515 nm Efficiency: ~50% Third Harmonic Generation 343 nm Efficiency: ~15% Beam Control Electro-Optic Modulator (Pulse Picker) Single shot to 400 khz Dynamic Pulse Energy Ramping Motion Control Aerotech XYZR Stages Scanlab Galvo mirrors Slide 17

18 Picosecond laser: Trumpf Trumicro 5050 Research: Micromachining and surface functionalisation Slide 18

19 Femtosecond laser: Amplitude Systemes s-pulse HP Technical Specifications Wavelength: 1030 nm Pulse Duration: <500 fs with Pulse Compression: <100 1µJ Pulse Energy: up to 1mJ Average Power: up to 4W Pulse Repetition Rate: Single Pulse to 300 khz M2 <1.2 Second Harmonic Generation 515 nm Efficiency: ~50% Third Harmonic Generation 343 nm Efficiency: ~15% Oscillator Output 29 MHz 400 mw Beam Control Electro-Optic Modulator (Pulse Picker) Single shot to 300kHz Motorised Pulse Energy Control Beam Delivery Scanlab Galvo Aerotech Air Bearing Stages Slide 19

20 Femtosecond laser: Overall system Research: Micro/nanomachining Real-time analysis of laser ablation Slide 20

21 Femtosecond Laser: Multi-output module schematic Slide 21

22 Femtosecond second: Pulse Compression Slide 22

23 Micromachining configuration Galvo S-Pulse HP Multi-output module Air Bearing Stages Slide 23

24 Realtime analysis of laser ablation Spectroscopy Schlieren/shadowgraphic imaging High speed imaging Slide 24

25 Realtime analysis of laser ablation Renishaw Raman Spectrometer Laser Ablation ICCD Camera Slide 25

26 Atomic Force Microscope AFM is in place to allow characterise material processing at the nanoscale Agilent 5500 AFM LIPSS on polymer Slide 26

27 Preliminary Laser Outputs 1mm Blind well (0.36 mm deep) etched in glass: 500fs, 343nm, 4kHz, 5µJ, 25µm spot Slide 27

28 Preliminary Outputs Aiming to set-up Laser Direct Write capability for polymers. Initial polymerization achieved using resist materials (Ormocomp). Slide 28

29 Conclusion Inspire platform aims to deliver state-of-the-art research infrastructure for Ireland Open Access to the infrastructure is available to external researchers and industry through collaborative projects or direct contract NCLA has implemented an Ultrafast laser facility with Picosecond and Femtosecond capabilities. Real-time diagnostics allow research of laser ablation dynamics Flexibility in the laser outputs provides scope for industrial application development and basic research Slide 29

30 Acknowledgements All my colleagues at NCLA for their efforts in the implementation of the new facility This work was conducted under the framework of the Inspire programme, funded by the Irish Government's Programme for Research in Third Level Institutions, Cycle 4, National Development Plan Slide 30

31 Invitation to Launch: October 21 st, 2009 Official launch of new facility on October 21 st Technology workshop with guest speakers from Trumpf, Amplitude Systemes, NCLA, Applied Optics, and local industry See for more details All welcome Slide 31

32 National Centre for Laser Applications NUI, Galway Galway Ireland Telephone: Fax: Web: Slide 32

33 Additional Slides Slide 33

34 Facilities: Lasers Femto-second laser system with beam conditioning and micromachining station with vacuum chamber and high-resolution air-bearing x-y tables. 3 DPSS laser workstations with options for 1064, 532, 355 and 266 nm wavelengths. (Galvo beam delivery) 2 Excimer lasers at nm. (Micromachining workstation) Excimer lamp at 172 nm Pulsed and Q-switched YAG lasers and CO2 lasers with both machining head and galvo beam delivery Fiber laser with galvo head beam delivery High-power diode laser with fibre beam delivery Range of precision part handling and manipulation equipment Largest installed base of research lasers in Ireland Slide 34

35 CRANN Femtosecond laser Verdi V10 Diode-Pumped Solid-State Lasers, High-Power CW Output at 532 nm, Output Power>10W. Mira 900 F Modelocked Titanium:Sapphire (Ti:S) laser, Tuning Range from 700 to 980 nm, Output Power>1.3W, laser pulse <200 fs. Repetition Rate at 80MHz. Mira 900-OPO Synchronously-Pumped Optical Parametric Oscillator, Tuning Range from 525 to 750 nm, nm(signal), 1600nm-2600nm(Idler) Output Power >150 mw. Repetition Rate at 80MHz. Harmonic Generation 9300 The Harmonic Generator 9300 converts the output of Mira into the blue and ultraviolet wavelength ranges. Pulse Picker 9200 The Pulse Picker 9200 is a standalone accessory that offers control of the pulse repetition rate over a wide range. A dedicated controller allows repetition rates from 9.5 khz to 4.75MHz. Rates down to single-shot are possible with external control. Pulsewidth <160 fs. Micra V18 Broadband Ultrafast Ti:Sapphire Oscillators and Pump Laser 18W. RegA 9000 The RegA is a CW-pumped, Titanium:Sapphire (Ti:S) regenerative amplifier providing ultrafast pulses capable of pumping multiple OPAs at repetition rates as high as 300 khz. Legend Elite One-box regenerative Ti:Sapphire amplifiers with integrated pump laser. Center wavelength at 800 nm, Tenability from 750 nm to 900 nm, repetition rates at 1K Hz and pulse duration <130 fs. OPA 9400 Optical Parametric Amplifiers, Repetition Rate 250 khz, Pulse Energy 80 nj and Average Power 20 mw. Signal Output nm, Idler Output nm and Pulse width <225 fs. OPA 9800 Optical Parametric Amplifiers, Repetition Rate 250 khz, Pulse Energy 160 nj and Average Power 40 mw. Signal Output nm, Idler Output nm and Pulse width <225 fs. DFG 9800/9850 Difference frequency generators for the OPA 9800/9850 optical parametric oscillators to the mid-ir. Slide 35

High-Power Femtosecond Lasers

High-Power Femtosecond Lasers FEATURES 190 fs ps tunable pulse duration Up to 2 mj pulse energy Up to 20 W average power Single pulse 1 MHz tunable repetition rate Includes pulse picker for pulse-on-demand