CLEAN ROOM TECHNOLOGY

Transcription

1 CLEAN ROOM TECHNOLOGY Justin Mathew Applied Electronics and Instrumentation College Of Engineering, Trivandrum April 28, 2015 Justin Mathew (CET) Clean Room Technology April 28, / 18

2 Overview 1 Cleanroom Technology Overview 2 Classification Of Cleanroom 3 Cleanroom for different Industries 4 How cleanroom is acheived Onion Room Design Air Flow Regulation User Protocols 5 Common tools used in Cleanroom 6 Common tools used in a Micro Fabrication Facility 7 Examples Of Cleanroom Facilities Justin Mathew (CET) Clean Room Technology April 28, / 18

3 Cleanroom Technology A cleanroom is an artificially created environment with a very low level of environmental pollutants such as dust, airborne microbes, aerosol particles, and chemical vapors. The main purpose of a clean room is to Provide clean environment for the manufacturing of substances that are sensitive to environmental contamination. Provide operational conditions that meets the process Ensure safety in the cleansroom environment A cleanroom is designed to reduce the contamination of process and materials by removing or reducing contamination sources. Justin Mathew (CET) Clean Room Technology April 28, / 18

4 Classification of Cleanroom ISO Classification Standard Justin Mathew (CET) Clean Room Technology April 28, / 18

5 Cleanroom for different Industries Class 1 : Integrated circuit manufacturers manufacturing submicron geometries Class 10 : Semiconductor manufacturers producing integrated circuits with line widths below 2µm Class 100 : Used with a bacteria-free or particulatefree environment is required in the manufacture of aseptically produced injectable medicines. Class 1000 : Manufacture of high quality optical equipment. Assembly and testing of precision gyroscope Class : Assembly of precision of hydraulic or pneumatic equipment, servo-control valves, precision timing devices, highgrade gearing. Justin Mathew (CET) Clean Room Technology April 28, / 18

6 How cleanroom is acheived Several design procedures and user protocols allows to acheive cleanrooms that can are suitable for semiconductor maufacturing process Design steps Several design methods of the facility help maintain the high degree of clenliness Onion Room Concept : The onion concept where the cleanest areas are inside which can be accessed only through successive cleaner areas. Air flow regulation : Air flow is designed to control the flow of particulates in the air of cleanroom User Protocols User protocols like dress code and other entry procedures ensures minimal dust or contaminants enter the facilty through the personnel. Justin Mathew (CET) Clean Room Technology April 28, / 18

7 Onion Room Design In this design concept, the cleaner rooms are towards the inner portion and the user and equipments are passed through relatively cleaner areas through different cleaning procedures before accesing the cleaner work environment. Justin Mathew (CET) Clean Room Technology April 28, / 18

8 Air Flow Regulation Turbulant Air Flow Laminar Air Flow Turbulant airflow distributes any residual particles uniformly and provides a dilution effect. Laminar Air flow provides a piston effect pushing the contaminated air down which then is removed. Justin Mathew (CET) Clean Room Technology April 28, / 18

9 User Protocols Dress Code Gowning Procedure Put on a new HAIR COVER. Put on new BEARD/FACIAL HAIR COVER if you have facial hair. Put on non-powdered GLOVES. Put on new BOOTIES or dedicated cleanroom shoes. Put on a clean LAB COAT or COVERALLS. Justin Mathew (CET) Clean Room Technology April 28, / 18

10 Common tools used in Cleanroom High Efficiency Particulate Air Filter (HEPA) Filter out particulates and bacteria in the incoming air. Ultra Low Penetration Air (ULPA) filters ULPA is also used to filter out particulates, bacteria and viruses. Pneumatic Filter Used to remove particulates from compressed air stream Air Ionizer Air ionisers have been used to eliminate the occurrence of Acinetobacter and reduce static electricity buildup in electronics. Chemical Fume Extractor Explosion Proof Vaccum cleaners Static Control Products Static control material like Ionization Equipment, ESD Wrist Straps, ESD Grounding Cords, ESD Labels and Signs,ESD Bags, ESD Vacuum, ESD Chair, ESD Equipment Covers, ESD Test Equipment, ESD Heel Grounders, ESD Monitoring Systems Justin Mathew (CET) Clean Room Technology April 28, / 18

11 Common tools used in a Micro Fabrication Facility Deep Reactive Ion Etching tool DRIE is a highly anisotropic etch process used to create steep-sided holes and trenches in substrates, typically with high aspect ratios. It is used in advanced 3D wafer level packaging technology. Deep Reactive Ion Etching tool It is a way to produce a layer of oxide on the surface of a wafer. Modern oxidation systems can deal with wafers per hour. eg: Tempress anneal/oxidation system Justin Mathew (CET) Clean Room Technology April 28, / 18

12 Common tools used in a Micro Fabrication Facility E-beam Evaporation In this process, a source material is heated above its boiling temperature and evaporated to form a film on the surface. Here the heating is done by sweeping the substrate with high density electron beam. Gatestack Cluster Tool It is used for the formation of complete gatestack in 8 inch CMOS manufacturing process. Justin Mathew (CET) Clean Room Technology April 28, / 18

13 Common tools used in a Micro Fabrication Facility Wafer Bonding This bonding system can be used for all wafer bonding processes such as anodic, thermo compression and silicon direct bonding Thermal Oxidation Oven It is used to grow thermal oxidation on wafer Justin Mathew (CET) Clean Room Technology April 28, / 18

14 Examples of Cleanroom facilities The Centre of Excellence in Nanoelectronics (CEN) Indian Institute of Technology Bombay 1000 sq. ft. of class 1000 clean room primarily for MEMS / Sensors related activity sq. ft. of class 10,000 clean room primarily for material/process characterization sq. ft. of class 1000 clean room dedicated to advanced process tools. Justin Mathew (CET) Clean Room Technology April 28, / 18

15 Examples of Cleanroom facilities National NanoFabrication Centre IISc Banglore Photolithography, Deposition and Etching MEMS and IC Packaging facility Wafer Dicing:Semiautomatic Wafer dicing machine for Silicon and Glass wafers. Wire Bonding:Semiautomatic wirebonder with Ball and Wedge bonding capability for Au, Al and Cu wires. Justin Mathew (CET) Clean Room Technology April 28, / 18

16 Examples of Cleanroom facilities Nano Fabrication Facility IIT Delhi IIT Delhi consists of a class 1000 clean room facility of 6000 sq.ft. area. The main features in the facility are: Electron beam lithography Nano-imprinting Plasma deposition and plasma etching Wafer bonding Electronic circuits CAD tools Scanning Electrochemical microscopy Electrochemical Quartz crystal Microbalance Justin Mathew (CET) Clean Room Technology April 28, / 18

17 Examples of Cleanroom Facilities Clean Room Facility IIT, Madras It houses Class-100 and Class-1000 clean rooms. Major facilities provided are: Double-sided lithography facility LPCVD for polysilicon deposition PECVD for dielectrics e-beam metallization unit and RIE for dry etching Wire and die bonder Mask writer DC/RF sputtering Electron beam evaporation DRIE-Bosch process Justin Mathew (CET) Clean Room Technology April 28, / 18

18 Thank You... Justin Mathew (CET) Clean Room Technology April 28, / 18