Manufacturing Challenges for Lithography in the Textured Disc Paradigm. September 18 th, 2008 Babak Heidari
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1 Manufacturing Challenges for Lithography in the Textured Disc Paradigm September 18 th, 2008 Babak Heidari
2 Longitudinal Perpendicular Pattern media + HAMR 6,25 T/in 2 TDK: DTR 602 Gb/in 2 1 T/in Gb/in Gb/in 2 Toshiba: DTR drive level demo 333 Gb/in 2 Near field (>100 GB) Manufacturing Research Roadmap Blu Ray (25 GB) Optical disk 1996: DVD (4.7 GB) 1982: CD (700 MB)
3 Technologies for DTR implementation Pattern replication using Nano-Imprint Stamp (Mold) Manufacturing process Polymer coating on media Imprint Lithography on both side of the media Pattern-transfer
4 Lithography solution for High Volume DTR manufacturing Stamp fabrication - Producing One Master stamp - Producing multiple copies from the master called Mother-stamp Final imprints on HDD substrates - Producing multiple copies from each Mother-stamp called Intermediate polymer stamps (IPS) - Use IPS for final imprints 1 st stamp Mother stamp Intermediate stamp Mother stamps Final imprints
5 Electron Beam Recorder, EBR System (EBR) Rotation Stage (θ-x) Thermal Field Emission (TFE) 50 kv EBR-50kV-TFE Software for On Fly Pattern generation HDD pattern writer DTR, BPM, Concentric patterns Optical disc writer BluRay, HD-DVD, Next generation optical disc, Spiral patterns Final output data is calculated on the fly during exposure
6 Electron Beam Lithography Stage movements Stage movements Writing field Spiral writing Concentric writing
7 Active feed-back systems to improve accuracy Beam Current Measured after several track recording to control the beam to ensure the Dose uniformity and long time exposure capability Beam position, Sub beam Deflection within 1 micron <1 nm beam deflection resolution High speed X-Y beam deflection Linear stage Laser interferometer including interpolator to reach 0.5 nm resolution Linear positioning accuracy 1.5nm 3sigma Rotational Air bearing High accuracy rotation encoder including interpolator for 1 nm resolution Rotation positioning accuracy 2nm 3sigma Other measurements Capacitive measured substrate topography to maintain focused beam on the substrate Measured unbalance and Run Out
8 Pattern definition and Writing strategy, DTR sector 2 sector 1 Data Tracks sector 0 Data Tracks Burst D Burst D Burst C Burst C Burst B Burst B Burst B Burst A Burst A Sector No. S(x) Sector No. S(x) Sector No. S(x) Sector No. S(x) Track Address T(n-1) Track Address T(n) Track Address T(n+1) Track Address T(n+2) Servo Address Preamble Data Tracks writing track
9 E-Beam exposed resist (70 nm pitch)
10 Quartz/Silicon Stamp Fabrication Substrate Metal mask Resist coating E-beam exposure Development Hexyl acetate Metal etching Substrate etching Resist & Metal removal Imprint stamp: etched SiO 2 on Si.
11 Nickel Stamp Fabrication for HVM High resolution E-beam resist is spin coated Exposure of the DTR structure using Polar E- beam recorder (EBR) Develop the exposed resist positive structure profile using Xylenes developer
12 Nickel Stamp Fabrication for HVM Sputter Metal seed-layer Electroplate 300um thick Nickel layer Separate the Nickel metal from the Master Nickel Father-Stamp This nickel stamp is called Father-Stamp
13 Nickel Stamp Fabrication for HVM Apply a mono-layer Oxide on the Fatherstamp, serving as separation-layer Electroplate new Nickel-stamp (Motherstamp) from the father Repeat the last electroplating process to produce several Mother-Stamps
14 DTR Nickel Mother-Stamp
15 Nano Imprint Lithography Process Solution for HDD Intermediate polymer stamp (IPS ) Mother Stamp IPS (Intermediate Polymer Stamp) IPS (UV-transparent film) STU UV UV-radiation IPS STU -polymer UV-radiation IPS UV monomer Constant working temperature STU -polymer Substrate UV-polymer Substrate
16 Double side imprint (IPS -Disk-IPS ) STU UV-radiation IPS #1 Constant working temperature STU -polymer STU -polymer HDD disk IPS #2 STU -polymer HDD disk STU -polymer
17 Double side imprint (IPS-Disk-IPS) Side A DTR structure Optical disk structure Side A Side B STU-polymer STU-polymer 2,5 disk Side B
18 Double side imprint (RRO measurement) Side A Radial Run Out measurements made in an Optical Disk test system showing RRO < 30nm Side B
19 Thank you for your valuable time
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